Browsing by Author "Lefaucheux, P."
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Publication A novel low temperature etch approach to reduce ULK plasma damage
Meeting abstract2015, Plasma Etch and Strip in Microtechnology - PESM, 27/04/2015Publication Applications of cryogenic plasma etching for microtechnology and advanced CMOS manufacturing
Meeting abstract2013, Plasma Etch and Strip in Microtechnology - PESM, 14/03/2013Publication Cryoetching of silicon and advanced materials for 3D interconnects
Meeting abstract2014, ECS Fall Meeting Symposium P5: Processing Materials of 3D Interconnects, Damascene, and Electronics Packaging 6, 5/10/2014, p.1689Publication Cryogenic etching of porous organosilicate low-k materials: fluorine based plasma analysis
Meeting abstract2015, Plasma Etch and Strip in Microtechnology - PESM, 27/04/2015Publication Cryogenic etching of porous organosilicate low-k materials: reduction of plasma induced damage
Meeting abstract2015, AVS 62nd International Symposium & Exhibition, 19/10/2015, p.124Publication Plasma cryoetching processes for silicon and advanced materials
;Dussart, R. ;Tillocher, T. ;Gosset, N. ;Vital, A ;Lefaucheux, P. ;L'jazouli, RBoufnichel, M.Meeting abstract2014, International Conference on Microelectronics and Plasma Technology - ICMAP, 8/07/2014Publication Reduction of plasma induced damage of porous low-k materials using a cryogenic etching process
Proceedings paper2015, 22nd International Symposium on Plasma Chemistry - ISPC, 5/07/2015, p.O-8-1