Browsing by Author "Li, M.F."
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Publication High performance & CMOS integration friendly dual metal gate MOSFETs using TaN/Ru or TaN/W/Ru stacking multi-layers on HfLaO gate dielectric
Publication Improved electrical and reliability characteristics of HfN/HfO2 gated nMOSFET with 0.95 nm EOT fabricated using a gate-first process
Publication Modulation of the Ni FUSI workfunction by Yb doping: from midgap to n-type band-edge
Publication Scalability and reliability of TaN/HfN/HfO2 gate stack fabricated by a high temperature process
Publication Schottky barrier height lowering by an increase of the substrate doping in PtSi Schottky barrier source/drain FETs
Journal article2007, IEEE Electron Device Letters, (28) 2, p.123-125Publication Widely tunable work function TaN/Ru stacking layer on HfLaO gate dielectric
Publication Work function tunability of refractory metal nitrides by lanthanum or aluminum doping for advanced CMOS devices