imec Institutional Repository Browsing {{ collection }} by Author "Mankelevich, Y."

Publication

Applications of cryogenic plasma etching for microtechnology and advanced CMOS manufacturing

Dussart, R.

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Lefaucheux, P.

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Tillocher, T.

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Ranson, P.

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Boufnichel, M.

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Ljazouli, R.

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Zhang, Liping

Meeting abstract

2013, Plasma Etch and Strip in Microtechnology - PESM, 14/03/2013

Publication

Damage free cryogenic etching of a porous organosilica ultralow-k film

Zhang, Liping

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Leffaucheux, P.

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Tillocher, T.

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Dussart, R.

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Mankelevich, Y.

Journal article

2013, Electrochemical and Solid-State Letters, (2) 2, p.N5-N7

Publication

Effect of VUV and EUV radiation on utra low-k materials damage

Braginsky, O.

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Kovalev, A.

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Lopaev, D.

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Mankelevich, Y.

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Proshina, O.

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Rakhimova, T.

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Rakhimov, A.

Proceedings paper

2013, Advanced Interconnects for Micro- and Nanoelectronics - Materials, Processes, and Reliability, 1/04/2013, p.AA03.11

Publication

F atoms interaction with nanoporous OSG low-k materials

Rakhimova, T.

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Rakhimov, A.

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Zyryanov, S.

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Lopaev, D.

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Mankelevich, Y.

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Proshina, O.

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Novikova, N.

Meeting abstract

2014, MRS Spring Meeting Symposium CC: New Materials and Processes for Interconnects, Novel Memory and Advanced Display Technologies, 15/03/2014, p.CC1.03-283

Publication

Interaction of atomic fluorine with porous low-k SiCOH films: modeling

Palov, A.

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Voronina, E.

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Lopaev, D.

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Mankelevich, Y.

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Rakhimova, T.

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Zyryanov, S.

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Proshina, O.

Oral presentation

2015, 22nd International Symposium on Plasma Chemistry - ISPC

Publication

Interaction of F atoms with SiCOH ultra low-k films. Part I: Fluorination and damage

Rakhimova, T.

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Lopaev, D.

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Mankelevich, Y.

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Rakhimov, A.

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Zyryanov, S.

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Kurchikov, K.

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Novikova, N.

Journal article

2015, Journal of Physics D: Applied Physics, (48) 17, p.175203

Publication

Interaction of F atoms with SiCOH ultra low-k films. Part II: Etching

Rakhimova, T.

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Lopaev, D.

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Mankelevich, Y.

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Kurchikov, K.

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Zyryanov, S.

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Palov, A.P.

Journal article

2015, Journal of Physics D: Applied Physics, (48) 17, p.175204

Publication

Low-k OSG damage and etching by F atoms at lowered temperatures

Zyryanov, S.

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Kurchikov, D.

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Lopaev, D.

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Mankelevich, Y.

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Palov, A.

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Rakhimova, T.

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Voronina, E.

Oral presentation

2015, 22nd International Symposium on Plasma Chemistry - ISPC

Publication

Modelling degradation of PTFE under electron irradiation

Palov, A.

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Fujii, H.

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Mankelevich, Y.

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Rakhimova, T.

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Baklanov, Mikhaïl

Journal article

2012, Polymer Degradation and Stability, (97) 5, p.802-809

Publication

Modification of OSG based low-k films under EUV and VUV exposure

Rakhimova, T.

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Rakhimov, A.

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Mankelevich, Y.

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Lopaev, D.

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Kovalev, A.

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Vasil'eva, A.

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Proshina, O.

Journal article

2013, Applied Physics Letters, 102, p.111902

Publication

Multi-step reaction mechanism for F atom interactions with organosilicate glass and SiOx films

Mankelevich, Y.

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Voronina, E.

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Rakhimova, T.

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Palov, A.

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Lopaev, D.V.

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Zyryanov, S.M.

Journal article

2016, Journal of Physics D: Applied Physics, (49) 34, p.345203

Publication

Ultra low-k dielectrics damage under VUV and EUV radiation

Zyryanov, S.

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Braginsky, O.

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Kovaev, A.

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Lopaev, D.

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Mankelevich, Y.

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Rakhimova, T.

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Rakhimov, A.

Meeting abstract

2012, 65th Gaseous Electronics Conference, 22/10/2012, p.CT2.00005

Browsing by Author "Mankelevich, Y."