Browsing by Author "Maslow, Mark"
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Publication Co-optimization of lithographic and patterning processes for improved EPE performance
Publication Elucidating the role of imaging metrics for variability and after etch defectivity
Journal article2022, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (21) 2, p.Art. 023201Publication Metal layer single EUV expose at pitch 28nm: how bright field and NTD resist advantages align
Proceedings paper2021, Conference on Extreme Ultraviolet (EUV) Lithography XII, FEB 22-26, 2021, p.116090RPublication SAQP and EUV block patterning of BEOL metal layers on IMEC's iN7 platform
Proceedings paper2017, Extreme Ultraviolet (EUV) Lithography VIII, 27/02/2017, p.101430HPublication Stitching enablement for anamorphic imaging: a ~1μm exclusion band and its implications
Proceedings paper2020, Extreme Ultraviolet Lithography 2020, 21/09/2020, p.1151713Publication The imec iN7 EUV platform: M2-Block and Via patterning developments
Proceedings paper2016, International Symposium on Extreme Ultraviolet Lithography - EUVL, 24/10/2016Publication Today's scorecard for tomorrow's photoresist: progress and outlook towards High-NA EUV lithography
Proceedings paper2021, Advances in Patterning Materials and Processes XXXVIII, 21/02/2021, p.1161204Publication Tomorrow's pitches on today's 0.33 NA scanner: pupil and imaging conditions to print P24 L/S and P28 contact holes
Proceedings paper2020, Extreme Ultraviolet Lithography 2020, 21/09/2020, p.1151716