Browsing by Author "McCoy, S."
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Publication A comparison of spike, flash, SPER and laser annealing for 45nm CMOS
Proceedings paper2003, CMOS Front-End Materials and Process Technology, 21/04/2003, p.261-266Publication Device characteristics of ultra-shallow junctions formed by fRTP annealing
Proceedings paper2004, Silicon Front-End Junction Formation - Physics and Technology, 12/04/2004, p.C1.3Publication Effect of varying the initial conditions prior to flash-assist rapid thermal processing on dopant activation, diffusion, and defect populations
Oral presentation2005, 8th International Workshop on the Fabrication, Characterization and Modeling of Ultra-Shallow Junctions in SemiconductorsPublication Influence of halo implant on leakage current and sheet resistance of ultra-shallow p-n junctions
Publication Influence of halo implant on leakage current and sheet resistance of ultrashallow p-n junctions
Publication Integrating diffusionless anneals into advanced CMOS technologies
Proceedings paper2004, Extended Abstracts of the International Conference on Solid State Devices and Materials - SSDM, 15/09/2004, p.180-181Publication Integration of low and high temperature junction anneals for 45nm CMOS
Proceedings paper2004, Advanced Short-Time Thermal Processing for Si-Based CMOS Devices II, 9/05/2004, p.145-156Publication Integration of ultra shallow junctions in PVD TaN nMOS transistors with flash lamp annealing
Proceedings paper2005-10, Extended Abstracts International Conference on Solid State Devices and Materials - SSDM, 13/09/2005, p.910-911Publication Leakage current and dopant activation characterization of SDE/halo CMOS junctions with non-contact junction photo-voltage metrology