Browsing by Author "Mesilhy, Hazem"
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Publication Attenuated phase shift mask for extreme ultraviolet: can they mitigate three-dimensional mask effects?
Journal article2018, Journal of Micro/Nanolithography MEMS and MOEMS, (18) 1, p.11005Publication Attenuated PSM for EUV: Can they mitigate 3D mask effects?
Proceedings paper2018, Extreme Ultraviolet (EUV) Lithography IX, 26/02/2018, p.1058312Publication Mask absorber for next generation EUV lithography
Proceedings paper2020, Conference on Extreme Ultraviolet Lithography, SEP 21-25, 2020Publication Perspectives and tradeoffs of absorber materials for high NA EUV lithography
Journal article2020, JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, (19) 4Publication Perspectives and tradeoffs of novel absorber materials for high NA EUV lithography
Proceedings paper2020, Extreme Ultraviolet (EUV) Lithography XI, 23/02/2020, p.1132309Publication Precise optical constants: determination and impact on metrology, simulation and development of EUV masks
Publication Simulation of polychromatic effects in high NA EUV lithography
Publication Study of novel EUVL mask absorber candidates
Journal article2021, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (20) 2