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Browsing by Author "Myers, Alan"

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    A novel method for characterizing resist performance

    Van Steenwinckel, David
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    Gronheid, Roel  
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    Lammers, J.H.
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    Myers, Alan
    ;
    Van Roey, Frieda  
    Proceedings paper
    2007, Advances in Resist Materials and Processing Technology XXIV, 25/02/2007, p.65190V
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    Compensation of overlay errors due to mask bending and non-flatness for EUV masks

    Chandhok, Manish
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    Goyal, Sanjay
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    Carson, Steve
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    Park, Seh-Jin
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    Zhang, Guojing
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    Myers, Alan
    Proceedings paper
    2009, Alternative Lithographic Technologies, 22/02/2009, p.72710G
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    EUV lithography program at IMEC

    Goethals, Mieke
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    Jonckheere, Rik  
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    Lorusso, Gian  
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    Hermans, Jan  
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    Van Roey, Frieda  
    ;
    Myers, Alan
    Proceedings paper
    2007, Emerging Lithographic Technologies XI, 27/02/2007, p.651709
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    EUV pattern shift compensation strategies

    Schmoeller, Thomas
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    Klimpel, Thomas
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    Kim, In Sung
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    Lorusso, Gian  
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    Myers, Alan
    ;
    Jonckheere, Rik  
    Proceedings paper
    2008, Emerging Lithographic Technologies XII, 24/02/2008, p.69211B
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    EUVL at IMEC: shadowing compensation and Flare mitigation

    Lorusso, Gian  
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    Goethals, Mieke
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    Jonckheere, Rik  
    ;
    Hermans, Jan  
    ;
    Ronse, Kurt  
    ;
    Myers, Alan
    Journal article
    2007-11, Journal of Vacuum Science and Technology B, (25) 6
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    Experimental validation of full-field extreme ultraviolet lithography flare and shadowing corrections

    Myers, Alan
    ;
    Lorusso, Gian  
    ;
    Kim, In Sung
    ;
    Goethals, Mieke
    ;
    Jonckheere, Rik  
    ;
    Hermans, Jan  
    Journal article
    2008, Journal of Vacuum Science and Technology B, (26) 6, p.2215-2219
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    Flare mitigation strategies in extreme ultraviolet lithography

    Kim, Insung
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    Myers, Alan
    ;
    Melvin, Lawrence
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    Ward, Brian
    ;
    Lorusso, Gian  
    ;
    Jonckheere, Rik  
    Journal article
    2008, Microelectronic Engineering, (85) 5_6, p.738-743
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    Full field EUV lithography turning into reality at IMEC

    Jonckheere, Rik  
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    Lorusso, Gian  
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    Goethals, Mieke
    ;
    Hermans, Jan  
    ;
    Baudemprez, Bart  
    ;
    Myers, Alan
    Proceedings paper
    2007, Photomask Japan (PMJ) - Photomask and Next-Generation Lithography Mask Technology XIV, 17/04/2007, p.66070H
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    Imaging performance of the EUV alpha demo tool at IMEC

    Lorusso, Gian  
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    Hermans, Jan  
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    Goethals, Mieke
    ;
    Baudemprez, Bart  
    ;
    Van Roey, Frieda  
    ;
    Myers, Alan
    Proceedings paper
    2008, Emerging Lithographic Technologies XII, 24/02/2008, p.69210O
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    Implementing full field EUV lithography using the ADT

    Goethals, Mieke
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    Hendrickx, Eric  
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    Jonckheere, Rik  
    ;
    Lorusso, Gian  
    ;
    Baudemprez, Bart  
    ;
    Hermans, Jan  
    Proceedings paper
    2008, International Symposium on Extreme Ultraviolet Lithography - EUVL, 28/09/2008
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    Investigation of EUV mask defectivity via full-field printing and inspection on wafer

    Jonckheere, Rik  
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    Van Den Heuvel, Dieter  
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    Iwamoto, Fumio
    ;
    Stepanenko, Nickolay
    ;
    Myers, Alan
    Proceedings paper
    2009, Photomask and Next-Generation Lithography Mask Technology XVI, 8/04/2009, p.73790R
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    Progress in full field EUV lithography program at IMEC

    Goethals, Mieke
    ;
    Lorusso, Gian  
    ;
    Jonckheere, Rik  
    ;
    Baudemprez, Bart  
    ;
    Hermans, Jan  
    ;
    Iwamoto, Fumio
    Proceedings paper
    2007, International EUVL Sympsoium, 28/10/2007
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    Shadowing effect compensation

    Lorusso, Gian  
    ;
    Kim, Insung
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    Baudemprez, Bart  
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    Myers, Alan
    ;
    Hermans, Jan  
    ;
    Jonckheere, Rik  
    Oral presentation
    2007, International EUVL Symposium
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    Status of EUV lithography at IMEC

    Goethals, Mieke
    ;
    Jonckheere, Rik  
    ;
    Lorusso, Gian  
    ;
    Hermans, Jan  
    ;
    Van Roey, Frieda  
    ;
    Myers, Alan
    Journal article
    2007, Journal of Photopolymer Science & Technology, (20) 3, p.383-292
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    Systematic quantification of flare mitigation strategies

    Myers, Alan
    ;
    Kim, Insung
    ;
    Lorusso, Gian  
    ;
    Jonckheere, Rik  
    ;
    Hermans, Jan  
    ;
    Baudemprez, Bart  
    Proceedings paper
    2007, International EUVL Symposium, 28/10/2007

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