Browsing by Author "Myers, Alan"
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Publication A novel method for characterizing resist performance
Proceedings paper2007, Advances in Resist Materials and Processing Technology XXIV, 25/02/2007, p.65190VPublication Compensation of overlay errors due to mask bending and non-flatness for EUV masks
;Chandhok, Manish ;Goyal, Sanjay ;Carson, Steve ;Park, Seh-Jin ;Zhang, GuojingMyers, AlanProceedings paper2009, Alternative Lithographic Technologies, 22/02/2009, p.72710GPublication EUV lithography program at IMEC
Proceedings paper2007, Emerging Lithographic Technologies XI, 27/02/2007, p.651709Publication EUV pattern shift compensation strategies
Proceedings paper2008, Emerging Lithographic Technologies XII, 24/02/2008, p.69211BPublication EUVL at IMEC: shadowing compensation and Flare mitigation
Journal article2007-11, Journal of Vacuum Science and Technology B, (25) 6Publication Experimental validation of full-field extreme ultraviolet lithography flare and shadowing corrections
Journal article2008, Journal of Vacuum Science and Technology B, (26) 6, p.2215-2219Publication Flare mitigation strategies in extreme ultraviolet lithography
Journal article2008, Microelectronic Engineering, (85) 5_6, p.738-743Publication Full field EUV lithography turning into reality at IMEC
Proceedings paper2007, Photomask Japan (PMJ) - Photomask and Next-Generation Lithography Mask Technology XIV, 17/04/2007, p.66070HPublication Imaging performance of the EUV alpha demo tool at IMEC
Proceedings paper2008, Emerging Lithographic Technologies XII, 24/02/2008, p.69210OPublication Implementing full field EUV lithography using the ADT
;Goethals, Mieke; ; ; ; Proceedings paper2008, International Symposium on Extreme Ultraviolet Lithography - EUVL, 28/09/2008Publication Investigation of EUV mask defectivity via full-field printing and inspection on wafer
Proceedings paper2009, Photomask and Next-Generation Lithography Mask Technology XVI, 8/04/2009, p.73790RPublication Progress in full field EUV lithography program at IMEC
Proceedings paper2007, International EUVL Sympsoium, 28/10/2007Publication Status of EUV lithography at IMEC
Journal article2007, Journal of Photopolymer Science & Technology, (20) 3, p.383-292Publication Systematic quantification of flare mitigation strategies
Proceedings paper2007, International EUVL Symposium, 28/10/2007