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Browsing by Author "Nagaswami, Venkat"

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    Al2O3 surface passivation : electrical characterization using the Quantox tool

    Rothschild, Aude
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    Nishibe, Nishibe
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    Cui, Jianli
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    Zhu, Nanchang
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    Debucquoy, Maarten  
    Proceedings paper
    2011, 37th IEEE Photovoltaic Specialists Conference - PVSC, 19/06/2011
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    Defect capture sensitivity in 14 nm half-pitch line/space DSA patterns

    Pathangi Sriraman, Hari
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    Gronheid, Roel  
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    Van Den Heuvel, Dieter  
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    Rincon Delgadillo, Paulina  
    Meeting abstract
    2014, Micro and Nano Engineering Conference - MNE, 22/09/2014
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    Defect mitigation and root cause studies in imec's 14 nm half-pitch chemo-epitaxy DSA flow

    Pathangi Sriraman, Hari
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    Chan, BT  
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    Bayana, Hareen  
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    Van Den Heuvel, Dieter  
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    Van Look, Lieve  
    Proceedings paper
    2015, Alternative Lithographic Technologies VII, 22/02/2015, p.94230M
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    Defect reduction and defect stability in imec's 14nm half pitch chemo-epitaxy DSA flow

    Gronheid, Roel  
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    Rincon Delgadillo, Paulina  
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    Pathangi Sriraman, Hari
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    Van Den Heuvel, Dieter  
    Proceedings paper
    2014, Alternative Lithographic Technologies VI, 24/02/2014, p.904905
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    Defect source analysis of directed self-assembly process

    Rincon Delgadillo, Paulina  
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    Suri, Mayur
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    Durant, Stephane
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    Cross, Andrew  
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    Nagaswami, Venkat
    Journal article
    2013, Journal of Micro/Nanolithography MEMS and MOEMS, (12) 3, p.31112
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    Defect source analysis of directed self-assembly process (DSA of DSA)

    Rincon Delgadillo, Paulina  
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    Harukawa, Ryota
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    Suri, Mayur
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    Durant, Stephane
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    Cross, Andrew  
    Proceedings paper
    2013, Alternative Lithographic Technologies V, 24/02/2013, p.86800L
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    Inspection of directed self assembly defects

    Ito, Chikashi
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    Durant, Stephane
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    Lange, Steve
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    Harukawa, Ryota
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    Miyagi, Takemasa
    Proceedings paper
    2014, Alternative Lithographic Technologies VI, 24/02/2014, p.90492D
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    Origin of defect in directed self-assembly of block copolymers using feature multiplication

    Rincon Delgadillo, Paulina  
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    Harukawa, Ryoto
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    Parnell, Doni
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    Lee, Yu-tsung
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    Chan, BT  
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    Lin, Guanyang
    Proceedings paper
    2013, IEEE Litho Workshop, 11/11/2013
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    Spectroscopic critical dimension technology (SCD) for directed self assembly

    Nishibe, Senichi
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    Dziura, Thaddeus
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    Nagaswami, Venkat
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    Gronheid, Roel  
    Proceedings paper
    2014, Metrology, Inspection, and Process Control for Microlithography XXVIII, 24/02/2014, p.90502U
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    Surface passivation : layer qualification using Quantox

    Rothschild, Aude
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    Nishibe, Shiniche
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    Cui, Jianli
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    Zhu, Nanchang
    ;
    Debucquoy, Maarten  
    Proceedings paper
    2011, 26th European Photovoltaic Solar Energy Conference - EU PVSEC, 5/09/2011, p.1418-1422

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