imec Institutional Repository Browsing {{ collection }} by Author "Pireaux, J.J."

Publication

Effective attenuation length of Al Ka-excited Si2p photoelectrons in SiO2, Al2O3 and HfO2 thin films

Vitchev, R.G.

;

Defranoux, Chr

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Wolstenholme, J

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Conard, Thierry

;

Bender, Hugo

;

Pireaux, J.J.

Journal article

2005, Journal of Electron Spectroscopy and Related Phenomena, (149) 1_3, p.37-44

Publication

Interfacial chemistry at high-k oxide layers on pretreated silicon wafers: XPS and TOF-SIMS study

Vitchev, R.

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Conard, Thierry

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Bender, Hugo

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Houssiau, L.

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Pireaux, J.J.

Oral presentation

2004, 31st Conference on the Physics and Chemistry of Semiconductor Interfaces

Publication

Multitechnique characterisation of Al203 thin layers deposited on SiO2/Si surface by atomic layer chemical vapour deposition

Houssiau, L.

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Vitchev, R.G.

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Pireaux, J.J.

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Conard, Thierry

;

Bender, Hugo

;

Richard, Olivier

Proceedings paper

2003, AVS 4th International Conference on Microelectronics and Interfaces - ICMI, 3/03/2003, p.36-38

Publication

Physical characterization of thin HfO2 layers by the combined analysis with complementary techniques

Bender, Hugo

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Conard, Thierry

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Richard, Olivier

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Brijs, Bert

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Petry, Jasmine

Proceedings paper

2003, Analytical Techniques for Semiconductor Materials and Processes, 27/04/2003, p.223-232

Publication

Surface reactions on silanised tantalum pentoxide for biosensor realisation

Laureyn, Wim

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De Palma, Randy

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Frederix, Filip

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Bonroy, Kristien

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Friedt, Jean-Michel

Oral presentation

2002, Workshop on New Trends in Applied Surface Science

Publication

X-ray photoelectron spectroscopy characterisation of high-k dielectric Al2O3 and HfO2 layers deposited on SiO2/Si surface

Vitchev, R.G.

;

Pireaux, J.J.

;

Conard, Thierry

;

Bender, Hugo

;

Wolstenholme, J.

;

Defranoux, C.

Journal article

2004, Applied Surface Science, (235) 1_2, p.21-25

Browsing by Author "Pireaux, J.J."