Browsing by Author "Pollers, Ingrid"
Now showing 1 - 10 of 10
- Results Per Page
- Sort Options
Publication 193 nm lithography on a full field scanner
Proceedings paper1999, Optical Microlithography XII, 14/03/1999, p.278-289Publication ArF step-and-scan exposure system for 0.15-μm and 0.13-μm technology nodes
Publication Implementation of ArF resist processes for 130nm and below
Journal article2000, Journal of Photopolymer Science and Technology, (13) 4, p.635-644Publication Introducing 193 nm lithography
Proceedings paper1998, Proceedings of the Microlithography Symposium. Interface '98, 15/11/1998, p.179-198Publication Lithographic performance of 193 nm resist
Proceedings paper1998, 193nm '98. At the Peak. 4th International Symposium on 193 nm Lithography. Abstracts Book, 14/09/1998, p.P-020Publication Lithographic performance of 193 nm single and bi-layer materials
Journal article1998, Journal of Photopolymer Science and Technology, (11) 3, p.513-23Publication Optimization of an advanced positive DUV resist for 248 nm L/S pattern printing
Oral presentation1998, MNE 98 - Micro- and Nano-Engineering Conference; 22-24 Sept. 1998; Leuven, Belgium.Publication Optimization of an advanced positive DUV resist for 248 nm L/S pattern printing
Journal article1999, Microelectronic Engineering, (46) 1_4, p.353-357Publication Recent advancements in 193 nm step and scan lithography
Journal article1999, Journal of Photopolymer Science and Technology, (12) 3, p.445-456Publication Status of ArF lithography for the 130nm technology node
Proceedings paper2000, Optical Microlithography XIII, 1/03/2000, p.410