Browsing by Author "Rakhimova, Tatyana"
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Publication 1-D model of RF CCP discharge in Ar/CF4/CF3I gas mixtures
Publication Area-selective Ru ALD by amorphous carbon modification using H plasma: from atomistic modeling to full wafer process integration
Journal article2020, MATERIALS ADVANCES, (1) 8, p.3049-3057Publication Comparison between Vacuum Ultra-Violet emission of CF4/Ar and CF3I/Ar plasmas in CCP chamber for low-k etching
Journal article2016, Plasma Sources Science and Technology, (25) 5, p.55001Publication Dry cleaning and doping of MX2 for contact engineering
Meeting abstract2018, AVS 65th International Symposium & Exhibition, 21/10/2018Publication Dry cleaning of WS2 using reducing downstream plasma
Meeting abstract2019, PESM 2019, 20/05/2019Publication Effect of energetic ions on plasma damage of SiCOH low-k material
Journal article2010, Journal of Vacuum Science and Technology B, (28) 3, p.450-459Publication Effect of top power on a low-k film during oxygen strip in a TCP chamber
Journal article2010, Microelectronic Engineering, (87) 3, p.462-465Publication Experimental and theoretical studies of radical production in RF CCP discharge at 81-MHz frequency in Ar/CF4 and Ar/CHF3 mixtures
Publication Mechanisms of hydrogen atom interactions with MoS2 monolayer
Publication Reactive plasma cleaning and restoration of transition metal dichalcogenide monolayers
Journal article2021, NPJ 2D MATERIALS AND APPLICATIONS, (5) 1, p.17Publication Recombination of O and H atoms on the surface of nanoporous dielectrics
Publication Understanding the interaction mechanisms between amorphous carbon sacrificial patterning material and H2 plasma to enable area-selective ALD processes
Meeting abstract2019, PESM2019, 20/05/2019