Browsing by Author "Rezvanov, Askar"
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Publication A Novel Volatile Film for Dielectric Plasma Damage Protection
Meeting abstract2019, Plasma Etch and Strip in Microtechnology Workshop - PESM, 20/05/2019Publication Area selective grafting of siloxane molecules on low-k dielectric with resepct to copper surface
Journal article2019, Applied Surface Science, 476, p.317-324Publication Area-selective grafting of siloxane molecules on low-k dielectric with respect to copper surface
Meeting abstract2018, Materials for Advanced Metallization Conference - MAM, 18/03/2018, p.02SALDPublication Cryogenic etching of porous low-k dielectrics in CF3Br plasma
;Rezvanov, Askar ;Miakonkikh, A. ;Vishnevskiy, A. ;Gitshin, O. ;Rudenko, K.Baklanov, MikhaïlOral presentation2016, Materials for Advanced Metallization conference - MAMPublication Gas phase pore stuffing for the protection of organo-silicate glass dielectric materials
Proceedings paper2018, 2018 International Symposium on Semiconductor Manufacturing - ISSM, 10/12/2018, p.1-3Publication Gas-phase pore stuffing for low-damage patterning of organo-silicate glass dielectric materials
Meeting abstract2018, AVS 65th Meeting & Exhibition 2018, 21/10/2018, p.PSM-WeA9Publication Low-k protection from F radicals and VUV photons using a multilayer pore grafting approach
;Zotovich, Alexey ;Rezvanov, Askar ;Chanson, Romain ;Zhang, L. ;Hacker, N.Kurchikov, K.Journal article2018, Journal of Physics D: Applied Physics, (51) 32, p.325202Publication Pore surface grafting of porous low-k dielectrics by selective polymers
Meeting abstract2016, Plasma Etch and Strip in Microtechnology - PESM, 5/09/2016Publication Pore surface grafting of porous low-k dielectrics by selective polymers
Journal article2017, Journal of Vacuum Science and Technology B, (25) 2, p.21211Publication Use of a thermally degradable chemical vapor deposited polymer film for low damage plasma processing of highly porous dielectrics
Journal article2019, ACS Applied Electronic Materials, (1) 12, p.2602-2611