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Browsing by Author "Schanovsky, F."

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    A TCAD Compatible SONOS Trapping Layer Model for Accurate Programming Dynamics

    Schanovsky, F.
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    Rzepa, G.
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    Stanojevic, Z.
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    Kernstock, C.
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    Baumgartner, O.
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    Karner, M.
    Proceedings paper
    2021, IEEE International Memory Workshop (IMW), MAY 16-19, 2021, p.64-67
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    Advanced characterization of oxide traps: the dynamic time-dependent defect spectroscopy

    Grasser, Tibor
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    Rott, K.
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    Reisinger, H.
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    Wagner, P.J.
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    Goes, W
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    Schanovsky, F.
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    Waltl, M.
    Proceedings paper
    2013, IEEE International Reliability Physics Symposium - IRPS, 14/04/2013, p.2D.2
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    Characterization and physical modeling of the temporal evolution of near-interfacial states resulting from NBTI/PBTI stress in nMOS/pMOS transistors

    Grasser, T.
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    Stampfer, B.
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    Waltl, M.
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    Rzepa, G.
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    Rupp, K.
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    Schanovsky, F.
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    Pobegen, G.
    Proceedings paper
    2018, 2018 IEEE International Reliability Physics Symposium - IRPS, 13/03/2018, p.2A.2-1-2A.2-10
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    Direct tunneling and gate current fluctuations

    Baumgartner, O.
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    Bina, M.
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    Goes, W.
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    Schanovsky, F.
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    Toledano Luque, Maria
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    Kaczer, Ben  
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    Kosina, H.
    Proceedings paper
    2013, International Conference on Simulation of Semiconductor Processes and Devices - SISPAD, 3/09/2013, p.17-20
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    Hydrogen-related volatile defects as the possible cause for the recoverable component of NBTI

    Grasser, T.
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    Rott, K.
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    Reisinger, H.
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    Waltl, M.
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    Wagner, P.
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    Schanovsky, F.
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    Goes, W.
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    Pobegen, G.
    Proceedings paper
    2013, International Electron Devices Meeting - IEDM, 9/12/2013, p.409-412
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    Modeling the Operation of Charge Trap Flash Memory–Part I: The Importance of Carrier Energy Relaxation

    Schanovsky, F.
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    Verreck, Devin  
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    Stanojevic, Z.
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    Schallert, S.
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    Arreghini, Antonio  
    Journal article
    2024, IEEE TRANSACTIONS ON ELECTRON DEVICES, (71) 1, p.547-553
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    Multiphonon processes as the origin of reliability issues

    Goes, Wolfgang
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    Toledano Luque, Maria
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    Schanovsky, F.
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    Bina, M.
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    Baumgartner, O.
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    Kaczer, Ben  
    Proceedings paper
    2013, Semiconductors, Dielectrics, and Materials for Nanoelectronics II, 27/10/2013, p.31-47
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    NBTI in nanoscale MOSFETs – The ultimate modeling menchmark

    Grasser, T.
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    Rott, K.
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    Reisinger, H.
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    Waltl, M.
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    Schanovsky, F.
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    Kaczer, Ben  
    Journal article
    2014, IEEE Transactions on Electron Devices, (61) 11, p.3586-3593
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    Reliability and Variability-Aware DTCO Flow: Demonstration of Projections to N3 FinFET and Nanosheet Technologies

    Rzepa, G.
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    Karner, M.
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    Baumgartner, O.
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    Strof, G.
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    Schanovsky, F.
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    Mitterbauer, F.
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    Kernstock, C.
    Proceedings paper
    2021, IEEE International Reliability Physics Symposium (IRPS), MAR 21-24, 2021
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    Understanding correlated drain and gate current fluctuations

    Goes, W.
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    Toledano Luque, Maria
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    Baumgartner, O.
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    Bina, M.
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    Schanovsky, F.
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    Kaczer, Ben  
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    Grasser, T.
    Proceedings paper
    2013, 20th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits - IPFA, 15/07/2013, p.51-56
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    Understanding the ISPP Slope in Charge Trap Flash Memory and its Impact on 3-D NAND Scaling

    Verreck, Devin  
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    Arreghini, Antonio  
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    Schanovsky, F.
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    Rzepa, G.
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    Stanojevic, Z.
    ;
    Mitterbauer, F.
    Proceedings paper
    2021, IEEE International Electron Devices Meeting (IEDM), DEC 11-16, 2021

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