Browsing by Author "Schanovsky, F."
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Publication A TCAD Compatible SONOS Trapping Layer Model for Accurate Programming Dynamics
;Schanovsky, F. ;Rzepa, G. ;Stanojevic, Z. ;Kernstock, C. ;Baumgartner, O.Karner, M.Proceedings paper2021, IEEE International Memory Workshop (IMW), MAY 16-19, 2021, p.64-67Publication Advanced characterization of oxide traps: the dynamic time-dependent defect spectroscopy
;Grasser, Tibor ;Rott, K. ;Reisinger, H. ;Wagner, P.J. ;Goes, W ;Schanovsky, F.Waltl, M.Proceedings paper2013, IEEE International Reliability Physics Symposium - IRPS, 14/04/2013, p.2D.2Publication Characterization and physical modeling of the temporal evolution of near-interfacial states resulting from NBTI/PBTI stress in nMOS/pMOS transistors
;Grasser, T. ;Stampfer, B. ;Waltl, M. ;Rzepa, G. ;Rupp, K. ;Schanovsky, F.Pobegen, G.Proceedings paper2018, 2018 IEEE International Reliability Physics Symposium - IRPS, 13/03/2018, p.2A.2-1-2A.2-10Publication Direct tunneling and gate current fluctuations
;Baumgartner, O. ;Bina, M. ;Goes, W. ;Schanovsky, F. ;Toledano Luque, Maria; Kosina, H.Proceedings paper2013, International Conference on Simulation of Semiconductor Processes and Devices - SISPAD, 3/09/2013, p.17-20Publication Hydrogen-related volatile defects as the possible cause for the recoverable component of NBTI
;Grasser, T. ;Rott, K. ;Reisinger, H. ;Waltl, M. ;Wagner, P. ;Schanovsky, F. ;Goes, W.Pobegen, G.Proceedings paper2013, International Electron Devices Meeting - IEDM, 9/12/2013, p.409-412Publication Modeling the Operation of Charge Trap Flash Memory–Part I: The Importance of Carrier Energy Relaxation
Journal article2024, IEEE TRANSACTIONS ON ELECTRON DEVICES, (71) 1, p.547-553Publication Multiphonon processes as the origin of reliability issues
Proceedings paper2013, Semiconductors, Dielectrics, and Materials for Nanoelectronics II, 27/10/2013, p.31-47Publication NBTI in nanoscale MOSFETs – The ultimate modeling menchmark
Journal article2014, IEEE Transactions on Electron Devices, (61) 11, p.3586-3593Publication Reliability and Variability-Aware DTCO Flow: Demonstration of Projections to N3 FinFET and Nanosheet Technologies
;Rzepa, G. ;Karner, M. ;Baumgartner, O. ;Strof, G. ;Schanovsky, F. ;Mitterbauer, F.Kernstock, C.Proceedings paper2021, IEEE International Reliability Physics Symposium (IRPS), MAR 21-24, 2021Publication Understanding correlated drain and gate current fluctuations
;Goes, W. ;Toledano Luque, Maria ;Baumgartner, O. ;Bina, M. ;Schanovsky, F.; Grasser, T.Proceedings paper2013, 20th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits - IPFA, 15/07/2013, p.51-56Publication Understanding the ISPP Slope in Charge Trap Flash Memory and its Impact on 3-D NAND Scaling
Proceedings paper2021, IEEE International Electron Devices Meeting (IEDM), DEC 11-16, 2021