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Browsing by Author "Schrimpf, Ronald"

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    Capacitance-frequency estimates of border-trap densities in multi-fin MOS capacitors

    Jiang, Rong
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    Zhang, En Xia
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    Liao, Wenjun
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    Liang, Chundong
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    Fleetwood, Daniel
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    Schrimpf, Ronald
    Journal article
    2018, IEEE Transactions on Nuclear Science, (65) 1, p.175-183
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    Effects of negative-bias-temperature-instability on low-frequency noise in SiGe p MOSFETs

    Duan, Guo Xing
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    Hachtel, Jordan
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    Zhang, En Xia
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    Zhang, Cher Xuan
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    Fleetwood, Daniel
    Journal article
    2016, IEEE Transactions on Device and Materials Reliability, (16) 4, p.541-548
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    Electrical effect of a single extended defect in MOSFETs: a simulation study

    Ni, Kai
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    Eneman, Geert  
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    Simoen, Eddy  
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    Mocuta, Anda
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    Collaert, Nadine  
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    Thean, Aaron  
    Journal article
    2016, IEEE Transactions on Electron Devices, (63) 8, p.3069-3075
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    Gate bias and length dependences of total-ionizing-dose effects in InGaAs FinFETs on bulk Si

    Zhao, Simeng
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    jiang, Rong
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    Wang, Pang
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    Zhang, En Xia
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    Waldron, Niamh  
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    Kunert, Bernadette
    Proceedings paper
    2018-09, Radiation Effects on Components and Systems - RADECS, 16/09/2018
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    Impacts of through-silicon vias on total-ionizing-dose effects and low-frequency noise in FinFETs

    Li, Kan
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    Zhang, Enxia
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    Gorchichko, Mariia
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    Wang, Pengfei
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    Hiblot, Gaspard  
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    Jourdain, Anne  
    Proceedings paper
    2020, Nuclear & Space Radiation Effects Conference - NSREC, 20/07/2020, p.PC-6
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    Interface and border traps in Ge pMOSFETs

    Fleetwood, Daniel
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    Simoen, Eddy  
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    Francis, Sarah
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    Zhang, C.X.
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    Arora, R.
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    Zhang, E.X.
    Meeting abstract
    2012, ECS Fall Meeting Symposium E6: High Purity Silicon 12, 7/10/2012, p.2637
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    Low-frequency Noise and Defects in Copper and Ruthenium Resistors

    Fleetwood, Dan
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    Beyne, Sofie  
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    jiang, Rong
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    Zhao, S. E.
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    Whang, P.
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    Bonaldo, S.
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    McCurdy, M. W.
    Journal article
    2019, Applied Physics Letters, (114) 20, p.203501
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    On the assessment of electrically active defects in high-mobility materials and devices

    Simoen, Eddy  
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    Eneman, Geert  
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    Oliveira, Alberto V.
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    Ni, Kai
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    Mitard, Jerome  
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    Witters, Liesbeth  
    Proceedings paper
    2016, 13th IEEE International Conference on Solid-State and Integrated Circuit Technology - ICSICT, 25/10/2016, p.300-303
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    Single-event induced charge collection in Ge-channel pMos FinFETs

    Rony, M.W.
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    Samsel, Isaak
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    Zhang, En Xia
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    Sternberg, Andrew
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    Li, Kan
    ;
    Reaz, Mahumed
    Proceedings paper
    2020-07, Nuclear & Space Radiation Effects Conference - NSREC, 1/12/2020, p.E-1
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    Total ionizing dose effects on strained Ge pMOS FinFETs on bulk Si

    Mitard, Jerome  
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    Zhang, En Xia
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    Fleetwood, Daniel
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    Hachtel, Jordan
    ;
    Liang, Chundong
    ;
    Reed, Robert
    Meeting abstract
    2016-07, IEEE Nuclear Space and Radiation Conference - NSREC, 13/07/2016
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    Total ionizing dose effects on ultra thin buried oxide floating body memories

    Mahatme, Nihaar
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    Schrimpf, Ronald
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    Reed, Robert
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    Bhuva, B.L.
    ;
    Griffoni, Alessio
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    Simoen, Eddy  
    Proceedings paper
    2012-04, IEEE International Reliability Physics Symposium - IRPS, 15/04/2012, p.MY-3

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