Browsing by Author "Shimura, Satoru"
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Publication Approaches to Enable Patterning of Tight Pitches towards High NA EUV
Publication EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing
Publication LWR reduction by novel lithographic and etch techniques
Proceedings paper2010, Advances in Resist Materials and Processing Technology XXVII, 21/02/2010, p.763914Publication Manufacturability improvements in EUV resist processing towards NXE:3300 processing
Proceedings paper2014, Advances in Patterning Materials and Processes XXXI, 23/02/2014, p.905108Publication Novel processing technologies for advanced EUV patterning materials using metal oxide resist (MOR)
Publication Recent advances in EUV patterning in preparation towards high-NA EUV
Proceedings paper2023, Conference on Advances in Patterning Materials and Processes XL, FEB 27-MAR 01, 2023, p.Art. 124981G