Browsing by Author "Stepanenko, Nickolay"
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Publication 157-nm photoresist process optimization for a full-field scanner
Proceedings paper2004-03, Optical Microlithography XVII, 22/02/2004, p.1658-1668Publication Alternative process schemes for double patterning that eliminate the intermediate etch step
Proceedings paper2008, Optical Microlithography XXI, 24/02/2008, p.69240PPublication EUV lithography program at IMEC
Proceedings paper2007, Emerging Lithographic Technologies XI, 27/02/2007, p.651709Publication Experimental investigation of fabrication process-, transportation-, storage, and handling-induced contamination of 157-nm reticles and vacuum-UV cleaning
Proceedings paper2004, Optical Microlithography XVII, 22/02/2004, p.487-503Publication Full field EUV lithography turning into reality at IMEC
Proceedings paper2007, Photomask Japan (PMJ) - Photomask and Next-Generation Lithography Mask Technology XIV, 17/04/2007, p.66070HPublication Implementing full field EUV lithography using the ADT
; ; ; ; Proceedings paper2008, International Symposium on Extreme Ultraviolet Lithography - EUVL, 28/09/2008Publication Investigation of EUV mask defectivity via full-field printing and inspection on wafer
Proceedings paper2009, Photomask and Next-Generation Lithography Mask Technology XVI, 8/04/2009, p.73790RPublication Measurement and evaluation of water uptake by resists, top coats and stacks and correlation with watermark defects
Proceedings paper2007, Advances in Resist Materials and Processing Technology XXIV, 25/02/2007, p.65190EPublication Optical path and image performane monitoring of a full-field 157-nm scanner
Proceedings paper2004, Optical Microlithography XVII, 22/02/2004, p.91-98Publication Progress in full field EUV lithography program at IMEC
Proceedings paper2007, International EUVL Sympsoium, 28/10/2007Publication Status of EUV lithography at IMEC
Journal article2007, Journal of Photopolymer Science & Technology, (20) 3, p.383-292Publication Studies of the defectivity formation mechanismes between the top coats and the resists in immersion lithography
Proceedings paper2005, 2nd International Symposium on Immersion Lithography, 12/09/2005