Browsing by Author "Tillocher, T."
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Publication Applications of cryogenic plasma etching for microtechnology and advanced CMOS manufacturing
Meeting abstract2013, Plasma Etch and Strip in Microtechnology - PESM, 14/03/2013Publication Cryoetching of silicon and advanced materials for 3D interconnects
Meeting abstract2014, ECS Fall Meeting Symposium P5: Processing Materials of 3D Interconnects, Damascene, and Electronics Packaging 6, 5/10/2014, p.1689Publication Cryogenic etching of porous organosilicate low-k materials: reduction of plasma induced damage
Meeting abstract2015, AVS 62nd International Symposium & Exhibition, 19/10/2015, p.124Publication Cryogenic etching processes applied to porous low-k materials using C4F8/SF6 plasmas
Journal article2015, Journal of Physics D: Applied Physics, (48) 43, p.435202Publication CVD of phosphorus-doped diamond: growth and characterisation
;Barjon, J. ;Pinault, M.A. ;Tillocher, T. ;Frangieh, G. ;Kobor, D. ;Chikoidze, E.Jomard, F.Oral presentation2009, NIMS & AIST WorkshopPublication Damage free cryogenic etching of a porous organosilica ultralow-k film
Journal article2013, Electrochemical and Solid-State Letters, (2) 2, p.N5-N7Publication Low-k cryo-etching : comparison of four different High Boiling Point Organic (HBPO)
;Chanson, Romain ;Lefaucheux, P.L. ;Dussart, R. ;Tillocher, T. ;Shen, P. ;Urabe, K.Dussarat, C.Meeting abstract2017, AVS 64th International Symposium & Exhibition, 28/10/2017, p.EM-ThP5Publication Plasma cryoetching processes for silicon and advanced materials
;Dussart, R. ;Tillocher, T. ;Gosset, N. ;Vital, A ;Lefaucheux, P. ;L'jazouli, RBoufnichel, M.Meeting abstract2014, International Conference on Microelectronics and Plasma Technology - ICMAP, 8/07/2014Publication Reduction of plasma induced damage of porous low-k materials using a cryogenic etching process
Proceedings paper2015, 22nd International Symposium on Plasma Chemistry - ISPC, 5/07/2015, p.O-8-1