Browsing by Author "Van Steenwinckel, David"
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Publication A novel method for characterizing resist performance
Journal article2008, Journal of Micro/Nanolithography, MEMS, and MOEMS, (7) 2, p.23002Publication A novel method for characterizing resist performance
Proceedings paper2007, Advances in Resist Materials and Processing Technology XXIV, 25/02/2007, p.65190VPublication Bio-interface development for CMOS based biosensors
Oral presentation2010, Knowledge for Growth ConventionPublication Investigation of statistical Fluctuations on line edge rougness
Publication Lithographic importance of acid diffusion in chemically amplified resists
Publication Overbake: sub-40-nm gate patterning with ArF lithography and binary masks
Proceedings paper2004, Advances in Resist Technology and Processing XXI, p.215-225Publication Performance assessment of novel resist approaches for EUV lithography using a single figure of merit
Proceedings paper2007, 6th International EUVL Symposium, 28/10/2007Publication Resist evaluation using EUV interference lithography
Oral presentation2004, 3rd International EUVL symposiumPublication Resolution, line width roughness and sensitivity in advanced photoresists
Journal article2008, Future Fab International, 26, p.65-72Publication Using KLUP for understanding trends in EUV resist performance
Journal article2008, Journal of Photopolymer Science and Technology, (21) 3, p.429-434