Browsing by Author "Verleysen, Eveline"
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Publication Characterization of nickel silicides using EELS-based methods
Journal article2010, Journal of Microscopy, (240) 1, p.75-82Publication Characterization of nickel-silicides by HAADF-STEM imaging
Proceedings paper2010, International Microscopy Congress - IMC-17, 19/09/2010Publication Chemical analysis of nickel silicides with high spatial resolution by combined EDS and EELS (ELNES)
Proceedings paper2008-09, 14th European Microscopy Congress, 1/09/2008, p.455-456Publication Chemical analysis of nickel silicides with high spatial resolution by combined EDS, EELS and ELNES
Meeting abstract2009, Microscopy of Semiconducting Materials Conference - MSMXVI, 17/03/2009Publication Chemical analysis of nickel silicides with high spatial resolution by combined EDS, EELS and ELNES
Journal article2010, Journal of Physics Conference Series, (209) 1, p.12057Publication Chemical analysis of thin films in electronic devices by analytical transmission electron microscopy methodologies
Verleysen, EvelinePHD thesis2013-03Publication Compositional characterization of nickel silicides by HAADF-STEM imaging
Journal article2011, Journal of Materials Science, (46) 7, p.2001-2008Publication Compositional characterization of nickel silicides by HAADF-STEM imaging
Oral presentation2010, E-MRS Symposium Q: Quantitative Electron Microscopy for Research and IndustryPublication Damage in nickel silicides during FIB specimen preparation
Meeting abstract2011, Microscopy of Semiconducting Materials - MSM XVII, 4/04/2011Publication Epitaxial growth of hexagonal theta-nickel silicide on (001) Si
Proceedings paper2010, International Microscopy Congress - IMC-17, 19/09/2010Publication Experimental determination of inelastic mean free paths for calculation of TEM specimen thickness
Meeting abstract2011, International Conference on Frontiers of Characterization and Metrology for Nanoelectronics, 23/05/2011, p.TU-28Publication Ni(Pt)Si thermal stability improvement by carbon implantation
Proceedings paper2008, Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-based CMOS 4: New Materials, Processes, and Equipment, 18/05/2008, p.397-404Publication Oxidation behavior of Ni thin films: application to NiO-based ReRAM
Meeting abstract2009, MRS Spring Meeting Symposium H: Materials and Physics for Nonvolatile Memories, 13/04/2009Publication Phase formation and thermal stability of ultrathin nickel-silicides on Si(100)
Publication Silicide yield improvement with NiPtSi formation by laser anneal for advanced low power platform CMOS technology
Proceedings paper2009, IEEE International Electron Devices Meeting - IEDM, 7/12/2009, p.23-26Publication TEM analysis in semiconductor industry: R&D examples of future needs
Meeting abstract2010, International Microscopy Congress - IMC17, 20/09/2010