Browsing by Author "Vermeire, Bert"

Journal article

1996, Journal of Applied Physics, (80) 1, p.382-386

Publication

Breakdown and instability of 3 nm Gate Oxide

Depas, Michel

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Vermeire, Bert

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Meeting abstract

1995, 26th IEEE Semiconductor Interface Specialists' Conference, 7/12/1995

Publication

Chemicals for the Chlorination of Gate Oxides

Mac Geary, M. J.

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Boeglin, H. J.

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Lubbers, A.

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Vermeire, Bert

Proceedings paper

1994, Vacuum and Semiconductor Processing Conference, 15/06/1994

Publication

Chlorine precursors for gate oxidation processes

Mc Geary, M. J.

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Vermeire, Bert

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Sprey, Hessel

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Lubbers, A.

Proceedings paper

1997, Environmental, Safety, and Health Issues in IC Production, 4/12/1996, p.115-125

Publication

Defect density of ultra-thin gate oxides grown by conventional oxidation processes

Depas, Michel

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Vermeire, Bert

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Proceedings paper

1994, Proceedings of the 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 19/09/1994, p.319-323

Publication

Determination of tunnelling parameters in ultra-thin oxide poly-Si/SiO2/Si structures

Depas, Michel

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Vermeire, Bert

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Van Meirhaeghe, R. L.

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Journal article

1995, Solid-State Electronics, (38) 8, p.1465-1471

Publication

Effect of Cl in gate oxidation

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McGeary, M. J.

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Sprey, Hessel

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Vermeire, Bert

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Depas, Michel

Proceedings paper

1997, Science and Technology of Semiconductor Surface Preparation, 1/04/1997, p.89-100

Publication

Effect of Cl in gate oxidation

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McGeary, M. J.

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Sprey, Hessel

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Vermeire, Bert

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Depas, Michel

Proceedings paper

1997, Materials Reliability in Microelectronics VII, 31/03/1997, p.149-160

Publication

Effect of different chlorine sources during gate oxidation

Vermeire, Bert

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Mac Geary, M. J.

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Kenis, Karine

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Proceedings paper

1994, Proceedings of the 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 19/09/1994, p.143-146

Publication

Environmentally-friendly chlorine during oxidation

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Vermeire, Bert

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McGeary, M. J.

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Depas, Michel

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Sees, J.

Proceedings paper

1995, Proceedings IES 41st Annual Technical Meeting, 30/04/1995, p.474-479

Publication

Evaluation of different chlorine sources for gate oxidation

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Vermeire, Bert

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Depas, Michel

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Proceedings paper

1995, 7th Annual Dielectrics and CVD Metallization Symposium, 6/02/1995, p.211-239

Publication

Growth kinetics and electrical characteristics of ultra-thin pyrogenetic silicon oxide

Depas, Michel

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Vermeire, Bert

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Journal article

1995, Microelectronic Engineering, (28) 1_4, p.125-128

Publication

Just-Clean- Enough technology for the 21st century

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Hurd, Trace

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Schmidt, Harald

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Depas, Michel

Oral presentation

1995, SEMICON Europe

Publication

Microroughness of clean silicon surfaces and gate oxide breakdown

Depas, Michel

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Crossley, A.

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Vermeire, Bert

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Sofield, C. J.

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Meeting abstract

1995, 26th IEEE Semiconductor Interface Specialists' Conference, 7/12/1995

Publication

Statistical analysis of gate oxide integrity test

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Vermeire, Bert

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Depas, Michel

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Gräf, D.

Proceedings paper

1994, Proceedings of the Institute of Environmental Science: 40th Annual Technical Meeting, 01/05/1994, p.350

Publication

The relation between sodium and aluminum contamination and dielectric breakdown in MOS structures

Vermeire, Bert

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Rotondaro, Antonio

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Verhaverbeke, Steven

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Proceedings paper

1994, Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 15/10/1993, p.58-64

Publication

Ultra-thin gate oxide yield and reliability

Depas, Michel

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Vermeire, Bert

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Proceedings paper

1994, Symposium on VLSI Technology, 09/06/1994, p.23-24

Publication

Wear-out of ultra-thin gate oxides during high-field electron tunnelling

Depas, Michel

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Vermeire, Bert

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