Browsing by Author "Vitchev, R.G."
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Publication Characterization of ultrathin high-k HfO2 layers grown on silicon: influence of the deposition parameters and interfacial layer
Oral presentation2004, 16th International Vacuum Congress - IVC-16Publication Effective attenuation length of Al Ka-excited Si2p photoelectrons in SiO2, Al2O3 and HfO2 thin films
Journal article2005, Journal of Electron Spectroscopy and Related Phenomena, (149) 1_3, p.37-44Publication Multitechnique characterisation of Al203 thin layers deposited on SiO2/Si surface by atomic layer chemical vapour deposition
Proceedings paper2003, AVS 4th International Conference on Microelectronics and Interfaces - ICMI, 3/03/2003, p.36-38Publication Tof-SIMS depth profiling of Hf and Al composition variations in ultrathin mixed HfO2/Al2O3 oxides
Oral presentation2003, International Conference on Secondary Ion Mass Spectrometry - SIMS XIVPublication ToF-SIMS depth profiling of Hf and Al composition variations in ultrathin mixed HfO2/Al2O3 oxides
Journal article2004, Applied Surface Science, 231-232, p.585-589Publication X-ray photoelectron spectroscopy characterisation of high-k dielectric Al2O3 and HfO2 layers deposited on SiO2/Si surface
Journal article2004, Applied Surface Science, (235) 1_2, p.21-25