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Browsing by Author "Walsby, Edward"

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    Characterization of optical end-point detection for via reveal processing

    Rassoul, Nouredine  
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    Jourdain, Anne  
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    Tutunjyan, Nina  
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    De Vos, Joeri  
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    Sardo, Stefano  
    Proceedings paper
    2018, IEEE 68th Electronic Components and Technology Conference - ECTC, 29/05/2018, p.1181-1187
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    Demonstration of a collective hybrid die-to-wafer integration using glass carrier

    Suhard, Samuel  
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    Kennes, Koen  
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    Bex, Pieter  
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    Jourdain, Anne  
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    Teugels, Lieve  
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    Walsby, Edward
    Proceedings paper
    2021, IEEE 71st Electronic Components and Technology Conference (ECTC), JUN 01-JUL 04, 2021, p.2064-2070
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    Direct Bonding Using Low Temperature SiCN Dielectrics

    Iacovo, Serena  
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    Nagano, Fuya  
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    Channam, Venkat Sunil Kumar  
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    Walsby, Edward
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    Crook, Kath
    Proceedings paper
    2022, 72nd IEEE Electronic Components and Technology Conference (ECTC), MAY 31-JUN 01, 2022, p.602-607
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    Etch process modules development and integration in 3D SOC applications

    Tutunjyan, Nina  
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    Sardo, Stefano  
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    De Vos, Joeri  
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    Van Huylenbroeck, Stefaan  
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    Jourdain, Anne  
    Meeting abstract
    2017, 10th International Workshop on Plasma Etch and Strip in Microtechnology - PESM, 19/10/2017
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    Extreme thinning of Si wafers for via-last and multi wafer stacking applications

    Jourdain, Anne  
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    De Vos, Joeri  
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    Rassoul, Nouredine  
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    Zahedmanesh, Houman  
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    Miller, Andy  
    Proceedings paper
    2018, IEEE 68th Electronic Components and Technology Conference - ECTC, 29/05/2018, p.1-8
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    Extreme Wafer Thinning and nano-TSV processing for 3D Heterogeneous Integration

    Jourdain, Anne  
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    Schleicher, Filip  
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    De Vos, Joeri  
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    Stucchi, Michele  
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    Chery, Emmanuel  
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    Miller, Andy  
    Proceedings paper
    2020, 70th IEEE Electronic Components and Technology Conference (ECTC), JUN 03-30, 2020, p.42-48
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    Extreme wafer thinning optimization for via-last applications

    Jourdain, Anne  
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    De Vos, Joeri  
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    Inoue, Fumihiro  
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    Rebibis, Kenneth June  
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    Miller, Andy  
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    Beyer, Gerald  
    Proceedings paper
    2016, IEEE International Conference on 3D System Integration - 3DIC, 8/11/2016, p.1-4
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    Low temperature SiCN as dielectric for hybrid bonding

    Channam, Venkat Sunil Kumar  
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    Iacovo, Serena  
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    Walsby, Edward
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    Belov, Igor
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    Jourdain, Anne  
    Proceedings paper
    2023, 7th IEEE Electron Devices Technology and Manufacturing Conference (EDTM), MAR 07-10, 2023
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    RIE dynamics for extreme wafer thinning applications

    Rassoul, Nouredine  
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    Jourdain, Anne  
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    Tutunjyan, Nina  
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    De Vos, Joeri  
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    Sardo, Stefano  
    Meeting abstract
    2017, PESM, 20/10/2017
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    Silicon microfluidics: an enabling technology for life sciences application

    Majeed, Bivragh  
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    Zhang, Lei  
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    Fiorentino, Giuseppe  
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    Verbinnen, Greet  
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    Ashraf, Huma
    Proceedings paper
    2017, IMAPS 50th Anniversary Symposium, 9/10/2017
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    Vapor deposited thin organic-inorganic capping layers preventing copper line oxidation in polymer-based RDL technologies

    Chery, Emmanuel  
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    Brady-Boyd, Anita  
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    Lin, Yuyuan
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    Grimes, Michael
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    Springer, David
    Journal article
    2022-10-15, Microelectronic Engineering, (266) 15 October 2022, p.111896-111902

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