Browsing by Author "Yen, Anthony"
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Publication 248 nm lithography for the 0.18 μm generation
Proceedings paper1996, Proceedings of the Microlithography Seminar INTERFACE'96, 27/10/1996, p.29-42Publication Characterization and correction of optical proximity effects in deep-ultraviolet lithography using behavior modeling
Journal article1996, Journal of Vacuum Science and Technology B, (14) 6, p.4175-4178Publication Characterization and optimization of CD control for 0.25µm CMOS applications
Proceedings paper1996, Optical Microlithography IX, 10/03/1996, p.555-563Publication Feasability demonstration of 0.18 µm and 0.13 µm optical projection lithography based on CD control calculations
Proceedings paper1996, Symposium on VLSI Technology. Digest of Technical Papers, 11/06/1996, p.186-187Publication Feature biasing versus feature-assisted lithography. A comparison of proximity correction methods for 0.5*(l/NA) lithography
Proceedings paper1995, Optical Laser Microlithography VIII, 22/02/1995, p.150-170Publication Optical proximity correction for 0.3 μm i-line lithography
Journal article1996, Microelectronic Engineering, 30, p.141-144Publication Optical proximity correction: mask pattern-generation challenges
Journal article1996, Microelectronic Engineering, 30, p.115-118Publication Optical proximity effects and correction strategies for chemical amplified DUV resists
Proceedings paper1996, Optical Microlithography IX, 10/03/1996, p.622-633Publication Optical proximity effects correction at 0.25 mm incorporating process variations in lithography
Proceedings paper1997, Optical Microlithography X, 12/03/1997, p.726-738Publication Optically enhanced i-line lithography for 0.3-μm random logic applications
Journal article1996, Solid State Technology, (39) March, p.S13-S19Publication Top-surface imaging and optical proximity correction: a way to 0.18 µm lithography at 248 nm
Proceedings paper1996, Optical Microlithography IX, 10/03/1996, p.362-374