Browsing by Author "Younkin, Todd"
- Results per page
- Sort Options
Publication A comparison of positive- and negative tone contact hole process flows using the IMEC NXE 3100
Proceedings paper2012, International Symposium on Extreme Ultraviolet Lithography - EUVL, 30/09/2012Publication Addressing the challenges of Directed Self Assembly implementation
Proceedings paper2011, International Symposium on Lithography Extensions, 20/10/2011Publication Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers
; Jack, Kevin S.Journal article2011, Journal of Materials Chemistry, (21) 15, p.5629-5637Publication Comparison of directed self-assembly integrations
Proceedings paper2012, Advances in Resist Materials and Processing Technology XXIX, 12/02/2012, p.83250GPublication Contact hole CD uniformity repair through directed self-assembly of cylindrical phase block copolymers
Oral presentation2012, MRS Fall M eeting Symposium S: Directed Self-Assembly for NanopatterningPublication Critical material properties for pattern collapse mitigation
Proceedings paper2012, Advances in Resist Materials and Processing Technology XXIX, 12/02/2012, p.83250RPublication EUV secondary electron blur at the 22nm half pitch node
Proceedings paper2011, Extreme Ultravioet (EUV) Lithography II, 27/02/2011, p.796904Publication Evaluation of integration schemes for contact-hole grapho-epitaxy DSA: a study of substrate and template affinity control
Proceedings paper2014, Alternative Lithographic Technologies VI, 23/02/2014, p.90491LPublication Evidence of speckle in extreme-UV lithography
Journal article2012-10, Optics Express, (20) 23, p.25970-25978Publication Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s: towards applications as EUV photoresists
Journal article2011, Radiation Physics and Chemistry, (80) 2, p.236-241Publication Extreme-ultraviolet secondary electron blur at the 22-nm half pitch node
Journal article2011, Journal of Micro/Nanolithography MEMS and MOEMS, (10) 3, p.33004Publication Frequency mulitiplication of lamellar phase block copolymers with grapho-epitaxy directed self-assembly sensitivity to prepattern
Journal article2012, Journal of Micro/Nanolithography MEMS and MOEMS, (11) 3, p.31303Publication Impact of EUV mask surface roughness on LER
Proceedings paper2012, Extreme Ultraviolet (EUV) Lithography III, 12/02/2012, p.83220NPublication Impact of extreme UV mask flatness on resist roughness
Oral presentation2012, Wilhelm and Else Heraeus Physics SchoolPublication Implementation of self-assembly in a 300mm processing environment
Oral presentation2012, IEEE Litho WorkshopPublication Implementation of self-assembly in a 300mm processing environment
Oral presentation2012, SPECTARIS User ForumPublication Implementation of self-assembly in a 300mm processing environment
Oral presentation2012, MinacNedPublication Laser anneal PEB: a viable route to RLS improvement
Oral presentation2012, Advances in Resist Materials and Processing Technology XXIXPublication Manufacturing challenges of directed self-assembly
Meeting abstract2013, AVS 60th International Symposium & Exhibition, 27/10/2013, p.44