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Browsing by Author "Zhang, J.F."

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    A test-proven As-grown-Generation (A-G) model for predicting NBTI under use-bias

    Ji, Z.
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    Zhang, J.F.
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    Lin, L.
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    Duan, M.
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    Zhang, W.
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    Zhang, X.
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    Gao, R.
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    Kaczer, Ben  
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    Franco, Jacopo  
    Proceedings paper
    2015, VLSI Technology Symposium, 15/06/2015, p.T36-T37
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    AC NBTI of Ge pMOSFETs: impact of energy alternating defects on lifetime prediction

    Ma, J.
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    Zhang, W.
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    Zhang, J.F.
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    Ji, Z.
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    Benbakhti, B.
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    Franco, Jacopo  
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    Mitard, Jerome  
    Proceedings paper
    2015, IEEE Symposium on VLSI Technology, 15/06/2015, p.T34-T35
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    Advanced electrical characterization toward (sub) 1nm EOT HfSiON – hole trapping in PFET and L-dependent effects

    Zahid, Mohammed
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    Pantisano, Luigi
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    Degraeve, Robin  
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    Aoulaiche, Marc
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    Trojman, Lionel
    Proceedings paper
    2007, Symposium on VLSI Technology. Digest of Technical Papers, 14/06/2007, p.32-33
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    An assessment of the mobility degradation induced by remote charge scattering

    Ji, Z.
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    Zhang, J.F.
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    Zhang, W.
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    Groeseneken, Guido  
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    Pantisano, Luigi
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    De Gendt, Stefan  
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    Heyns, Marc  
    Journal article
    2009, Applied Physics Letters, (95) 26, p.263502
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    Characterization of electron traps in Si-capped Ge MOSFETs with HfO2/SiO2 gate stack

    Benbakhti, B.
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    Zhang, J.F.
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    Li, Z.
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    Zhang, W
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    Mitard, Jerome  
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    Kaczer, Ben  
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    Groeseneken, Guido  
    Journal article
    2012, IEEE Electron Device Letters, (33) 12, p.1681-1683
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    Characterization of negative-bias temperature instability of Ge MOSFETs with GeO2/Al2O3 stack

    Ma, J.
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    Zhang, J.F.
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    Ji, Zhigang
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    Benbakhti, Brahim
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    Zhang, Wei Dong
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    Zheng, Xue Feng
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    Mitard, Jerome  
    Journal article
    2014, IEEE Transactions on Electron Devices, (61) 5, p.1307-1315
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    Damaging species in the hole injection induced electron trap generation

    Chang, M.H.
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    Zhang, J.F.
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    Groeseneken, Guido  
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    Degraeve, Robin  
    Oral presentation
    2003, Insulating Films on Semiconductors - INFOS. 13th Bi-Annual Conference
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    Degradation of oxides and oxynitrides under hot hole stress

    Zhang, J.F.
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    Sii, H. K.
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    Groeseneken, Guido  
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    Degraeve, Robin  
    Journal article
    2000, IEEE Trans. Electron Devices, (47) 2, p.378-386
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    Different types of positive charges generated near the oxide/Si interface

    Zhang, C.Z.
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    Zhang, J.F.
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    Groeseneken, Guido  
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    Degraeve, Robin  
    Oral presentation
    2003, Semiconductor Interfaxe Specialists Conference (SISC)
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    Effects of detrapping on electron traps generated in gate oxides

    Zhang, W.D.
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    Zhang, J.F.
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    Lalor, M.J.
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    Burton, D.R.
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    Groeseneken, Guido  
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    Degraeve, Robin  
    Journal article
    2003, Semiconductor Science and Technology, (18) 2, p.174-182
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    Effects of measurement temperature on NBTI

    Zhang, J.F.
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    Chang, M.H.
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    Groeseneken, Guido  
    Journal article
    2007-04, IEEE Electron Device Letters, (28) 4, p.298-300
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    Electron trap generation at different temperatures in the gate oxide

    Zhang, W.D.
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    Zhang, J.F.
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    Wood, M.
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    Lalor, M.
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    Burton, D.
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    Groeseneken, Guido  
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    Degraeve, Robin  
    Oral presentation
    2002, 33rd IEEE Semiconductor Interface Specialists Conference - SISC
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    Endurance improvement of more than five orders in GexSe1-x OTS selectors by using a novel refreshing scheme

    Hatem, Firas Odai Hatem
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    Chai, Z.
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    Zhang, Wei
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    Fantini, Andrea  
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    Degraeve, Robin  
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    Clima, Sergiu  
    Proceedings paper
    2019, IEEE International Electron Devices Meeting - IEDM 2019, 7/12/2019, p.827-830
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    ESD characterization of planar InGaAs devices

    Ji, Zhigang
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    Linten, Dimitri  
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    Boschke, Roman
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    Hellings, Geert  
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    Chen, Shih-Hung  
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    Alian, AliReza  
    Proceedings paper
    2015, IEEE International Reliability Physics Symposium - IRPS, 19/04/2015, p.3f.1
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    Generation of hole traps in oxides under high field stresses

    Zhao, Chao
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    Zhang, J.F.
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    Groeseneken, Guido  
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    Degraeve, Robin  
    Oral presentation
    2002, 33rd IEEE Semiconductor Interface Specialists Conference - SISC
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    Generation of mobile hydrogenous ions in gate oxide and their potential applications

    Zhao, C.
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    Zhang, J.F.
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    Groeseneken, Guido  
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    Degraeve, Robin  
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    Ellis, J. N.
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    Beech, C. D.
    Journal article
    2001, Electronics Letters, (37) 11, p.716-717
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    Hole trap generation in gate dielectric during substrate hole injection

    Zhang, J.F.
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    Sii, H.K.
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    Chen, A.H.
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    Zhao, C.Z.
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    Uren, M.J.
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    Groeseneken, Guido  
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    Degraeve, Robin  
    Journal article
    2004, Semiconductor Science and Technology, (19) 1, p.L1-L3
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    Hole traps in silicon dioxides - Part I: Properties

    Zhang, J.F.
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    Zhao, C.Z.
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    Chen, A.H.
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    Groeseneken, Guido  
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    Degraeve, Robin  
    Journal article
    2004-08, IEEE Trans. Electron Devices, (51) 8, p.1267-1273
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    Hole traps in silicon dioxides - Part II: Generation mechanism

    Zhao, C.Z.
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    Zhang, J.F.
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    Groeseneken, Guido  
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    Degraeve, Robin  
    Journal article
    2004-08, IEEE Trans. Electron Devices, (51) 8, p.1274-1280
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    Hydrogen induced and plasma charging enhanced positive charge generation in gate oxides

    Zhao, C.Z.
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    Zhang, J.F.
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    Groeseneken, Guido  
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    Degraeve, Robin  
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    Ellis, J. N.
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    Beech, C. D.
    Proceedings paper
    2000, 5th International Symposium on Plasma Process-Induced Damage, 23/05/2000, p.129-132
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