Browsing by Author "Zhang, J.F."
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Publication A test-proven As-grown-Generation (A-G) model for predicting NBTI under use-bias
Proceedings paper2015, VLSI Technology Symposium, 15/06/2015, p.T36-T37Publication AC NBTI of Ge pMOSFETs: impact of energy alternating defects on lifetime prediction
Proceedings paper2015, IEEE Symposium on VLSI Technology, 15/06/2015, p.T34-T35Publication Advanced electrical characterization toward (sub) 1nm EOT HfSiON – hole trapping in PFET and L-dependent effects
Proceedings paper2007, Symposium on VLSI Technology. Digest of Technical Papers, 14/06/2007, p.32-33Publication An assessment of the mobility degradation induced by remote charge scattering
;Ji, Z. ;Zhang, J.F. ;Zhang, W.; ;Pantisano, Luigi; Journal article2009, Applied Physics Letters, (95) 26, p.263502Publication Characterization of electron traps in Si-capped Ge MOSFETs with HfO2/SiO2 gate stack
Journal article2012, IEEE Electron Device Letters, (33) 12, p.1681-1683Publication Characterization of negative-bias temperature instability of Ge MOSFETs with GeO2/Al2O3 stack
;Ma, J. ;Zhang, J.F. ;Ji, Zhigang ;Benbakhti, Brahim ;Zhang, Wei Dong ;Zheng, Xue FengJournal article2014, IEEE Transactions on Electron Devices, (61) 5, p.1307-1315Publication Damaging species in the hole injection induced electron trap generation
Oral presentation2003, Insulating Films on Semiconductors - INFOS. 13th Bi-Annual ConferencePublication Degradation of oxides and oxynitrides under hot hole stress
Journal article2000, IEEE Trans. Electron Devices, (47) 2, p.378-386Publication Different types of positive charges generated near the oxide/Si interface
Oral presentation2003, Semiconductor Interfaxe Specialists Conference (SISC)Publication Effects of detrapping on electron traps generated in gate oxides
Journal article2003, Semiconductor Science and Technology, (18) 2, p.174-182Publication Effects of measurement temperature on NBTI
Journal article2007-04, IEEE Electron Device Letters, (28) 4, p.298-300Publication Electron trap generation at different temperatures in the gate oxide
Oral presentation2002, 33rd IEEE Semiconductor Interface Specialists Conference - SISCPublication Endurance improvement of more than five orders in GexSe1-x OTS selectors by using a novel refreshing scheme
Proceedings paper2019, IEEE International Electron Devices Meeting - IEDM 2019, 7/12/2019, p.827-830Publication ESD characterization of planar InGaAs devices
Proceedings paper2015, IEEE International Reliability Physics Symposium - IRPS, 19/04/2015, p.3f.1Publication Generation of hole traps in oxides under high field stresses
Oral presentation2002, 33rd IEEE Semiconductor Interface Specialists Conference - SISCPublication Generation of mobile hydrogenous ions in gate oxide and their potential applications
Journal article2001, Electronics Letters, (37) 11, p.716-717Publication Hole trap generation in gate dielectric during substrate hole injection
Journal article2004, Semiconductor Science and Technology, (19) 1, p.L1-L3Publication Hole traps in silicon dioxides - Part I: Properties
Journal article2004-08, IEEE Trans. Electron Devices, (51) 8, p.1267-1273Publication Hole traps in silicon dioxides - Part II: Generation mechanism
Journal article2004-08, IEEE Trans. Electron Devices, (51) 8, p.1274-1280Publication Hydrogen induced and plasma charging enhanced positive charge generation in gate oxides
Proceedings paper2000, 5th International Symposium on Plasma Process-Induced Damage, 23/05/2000, p.129-132