Browsing by author "Pagès, Xavier"

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A comparison of spike, flash, SPER and laser annealing for 45nm CMOS

Lindsay, Richard; Pawlak, Bartek; Kittl, Jorge; Henson, Kirklen; Torregiani, Cristina; Giangrandi, Simone; Surdeanu, Radu; Vandervorst, Wilfried; Mayur, A.; Ross, J.; McCoy, S.; Gelpey, J.; Elliott, K.; Pagès, Xavier; Satta, Alessandra; Lauwers, Anne; Stolk, P.; Maex, Karen (2003)
Advanced PMOS device architecture for highly-doped ultra-shallow junctions

Surdeanu, Radu; Pawlak, Bartek; Lindsay, Richard; Van Dal, Mark; Doornbos, Gerben; Dachs, C.J.J.; Ponomarev, Youri; Loo, Josine; Cubaynes, Florence; Henson, Kirklen; Verheijen, M.A.; Kaiser, M.; Pagès, Xavier; Stolk, Peter; Jurczak, Gosia (2004)
CMOS scaling beyond the 90 nm CMOS technology node: shallow junction and integration challenges

Dachs, Charles; Surdeanu, Radu; Pawlak, Bartek; Doornbos, Gerben; Duffy, R.; Heringa, Anco; Ponomarev, Youri; Venezia, Vincent; Van Dal, Mark; Stolk, P.; Lindsay, Richard; Henson, Kirklen; Dieu, B.; Geenen, Luc; Hoflijk, Ilse; Richard, Olivier; Clarysse, Trudo; Brijs, Bert; Vandervorst, Wilfried; Pagès, Xavier (2003)
Enhanced boron activation in silicon by high ramp-up rate solid phase epitaxial regrowth

Pawlak, Bartek; Vandervorst, Wilfried; Smith, A.J.; Cowern, Nick E.B.; Colombeau, B.; Pagès, Xavier (2005)
Integration of low and high temperature junction anneals for 45nm CMOS

Lindsay, Richard; Pawlak, Bartek; Henson, Kirklen; Satta, Alessandra; Severi, Simone; Lauwers, Anne; Surdeanu, Radu; McCoy, S.; Gelpey, J.; Pagès, Xavier; Maex, Karen (2004)
Leakage optimatisation of ultra-shallow junctions formed by solid phase epitaxial regrowth (SPER)

Lindsay, Richard; Pawlak, Bartek; Kittl, Jorge; Henson, Kirklen; Giangrandi, Simone; Duffy, Ray; Surdeanu, Radu; Vandervorst, Wilfried; Pagès, Xavier; Van der Jeugd, Kees; Stolk, P.; Maex, Karen (2003)
Leakage optimization of ultra-shallow junctions formed by solid phase epitaxial regrowth

Lindsay, Richard; Henson, Kirklen; Vandervorst, Wilfried; Maex, Karen; Pawlak, Bartek; Duffy, Ray; Surdeanu, Radu; Stolk, Peter; Kittl, Jorge; Giangrandi, Simone; Pagès, Xavier; Van der Jeugd, Kees (2004)
Ni-based silicides for 45 nm CMOS and beyond

Lauwers, Anne; Kittl, Jorge; Van Dal, Mark; Chamirian, Oxana; Kmieciak, Malgorzata; de Potter de ten Broeck, Muriel; Lindsay, Richard; Raymakers, Toon; Pagès, Xavier; Mebarki, Bencherki; Mandrekar, Tushar; Maex, Karen (2004)
Pre-amorphization and co-implantation suitability for advanced PMOS devices integration

Surdeanu, Radu; Pawlak, Bartek; Lindsay, Richard; Van Dal, Mark; Doornbos, Gerben; Dachs, Charles; Ponomarev, Youri; Loo, Josine; Henson, Kirklen; Verheijen, M.; Kaiser, M.; Pagès, Xavier; Jurczak, Gosia; Stolk, Peter (2003)
SPER junction optimisation in 45nm CMOS devices

Lindsay, Richard; Severi, Simone; Pawlak, Bartek; Henson, Kirklen; Lauwers, Anne; Pagès, Xavier; Satta, Alessandra; Surdeanu, Radu; Lendzian, H.; Maex, Karen (2004)
The effect of ramp rate - short process time and partial reactions on Cobalt and Nickel silicide formation

Pagès, Xavier; Van der Jeugd, Kees; Kuznetsov, Vladimir; Granneman, Ernst; Lauwers, Anne; Lindsay, Richard (2004)
The role of fluorine with Ge pre-amorphisation in forming PMOS junctions for the 65-nm CMOS technology node

Pawlak, Bartek; Lindsay, Richard; Surdeanu, Radu; Pagès, Xavier; Vandervorst, Wilfried; Van der Jeugd, Kees (2003)