Browsing by author "Iwasaki, Akihisa"
Now showing items 1-9 of 9
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BEOL pre-metallization wet clean: post-etch residue removal and metal compatibility
Le, Quoc Toan; Kesters, Els; Akanishi, Yuya; Iwasaki, Akihisa; Holsteyns, Frank (2018) -
Controlled ALE-type recess of molybdenum for future logic and memory applications
Pacco, Antoine; Nakano, Teppei; Iwasaki, Akihisa; Iwahata, Shota; Altamirano Sanchez, Efrain (2021) -
Development of an all-in one wet single wafer process for 3D-SIC bump integration and its monitoring
Suhard, Samuel; Iwasaki, Akihisa; Liebens, Maarten; Stiers, Karen; Slabbekoorn, John; Holsteyns, Frank (2016) -
Etching of molybdenum via a combination of low-temperature ozone oxidation and wet-chemical oxide dissolution
Pacco, Antoine; Nakano, Teppei; Iwahata, Shota; Iwasaki, Akihisa; Altamirano Sanchez, Efrain (2023) -
Impact of dissolved oxygen in dilute HF solution on material etch
Kesters, Els; Iwasaki, Akihisa; Le, Quoc Toan; Holsteyns, Frank (2016) -
Integrated clean for TSV: comparison between dry process and wet processes and their electrical qualification
Suhard, Samuel; Li, Yunlong; Iwasaki, Akihisa; Van Huylenbroeck, Stefaan; Draper, Simon; Mizutani, Atsushi; Dory, Thomas; Holsteyns, Frank (2016) -
Optimization of post etch cobalt compatible clean by pH and oxidizer
Iino, H.; Ogawa, Y.; Masaoka, T.; Le, Quoc Toan; Kesters, Els; Rip, Jens; Oniki, Yusuke; Akanishi, Y.; Iwasaki, Akihisa; Holsteyns, Frank (2018) -
Study of copper surface preparation by sequential atomic layer wet etching and laser annealing treatments
Iwasaki, Akihisa; Akanishi, Yuya; Mazzamuto, Fulvio; Kesters, Els; Le, Quoc Toan; Holsteyns, Frank (2017) -
Study of copper surface preparation by sequential atomic layer wet etching and laser annealing treatments
Iwasaki, Akihisa; Akanishi, Yuya; Matsumoto, Fulvio; Kesters, Els; Le, Quoc Toan; Holsteyns, Frank (2017)