Browsing by author "Steenbergen, Johnny"
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Group IV Epi processing, evolution in CMOS from 90 to 10nm node
Loo, Roger; Dhayalan, Sathish Kumar; Hikavyy, Andriy; Ike, Shinichi; Rondas, Dirk; Rosseel, Erik; Shimura, Yosuke; Steenbergen, Johnny; Sun, Jianwu; Wang, Wei; Langer, Robert (2014) -
Integration feasibility of porous SiLK semiconductor dielectric
Waeterloos, Joost; Struyf, Herbert; Van Aelst, Joke; Castillo, D. W.; Lucero, S.; Caluwaerts, Rudy; Alaerts, Carine; Mannaert, Geert; Boullart, Werner; Sleeckx, Erik; Schaekers, Marc; Tokei, Zsolt; Vervoort, Iwan; Steenbergen, Johnny; Sijmus, Bram; Vos, I.; Meuris, Marc; Iacopi, Francesca; Donaton, R (2001) -
Laser annealing of double implanted layers for IGBT power devices
Sabatier, Clement; Rack, Simon; Beseaucèle, Herve; Venturini, Julien; Hoffmann, Thomas Y.; Rosseel, Erik; Steenbergen, Johnny (2008) -
Non-linear dielectric constant increase with Ti composition in high-k ALD-HfTiOx films after O2 crystallization annealing
Tomida, Kazuyuki; Popovici, Mihaela Ioana; Opsomer, Karl; Menou, Nicolas; Delabie, Annelies; Swerts, Johan; Steenbergen, Johnny; Kaczer, Ben; Van Elshocht, Sven; Detavernier, Christophe; Wouters, Dirk; Kittl, Jorge (2009) -
Non-linear dielectric constant increase with Ti composition in high-k ALD-HfTiOx films after O2 crystallization annealing
Tomida, Kazuyuki; Popovici, Mihaela Ioana; Opsomer, Karl; Menou, Nicolas; Wang, Wan-Chih; Delabie, Annelies; Swerts, Johan; Steenbergen, Johnny; Kaczer, Ben; Van Elshocht, Sven; Detavernier, Christophe; Afanasiev, Valeri; Wouters, Dirk; Kittl, Jorge (2010) -
Phase formation and morphology of nickel silicide thin films synthesized by catalyzed chemical vapor reaction of nickel with silane
Peter, Antony; Meersschaut, Johan; Richard, Olivier; Moussa, Alain; Steenbergen, Johnny; Schaekers, Marc; Tokei, Zsolt; Van Elshocht, Sven; Adelmann, Christoph (2015) -
Selective oxidation of SiGe less than 50% versus Si using Low Temperature Steam Anneal at T less than or equal to 650°C
Wostyn, Kurt; Crovato, Nicola; Blancher, Ken; Van Bortel, Thomas; Kimura, Yosuke; Mertens, Hans; Vaisman Chasin, Adrian; Conard, Thierry; Douhard, Bastien; Meersschaut, Johan; Steenbergen, Johnny; Rondas, Dirk; Van Opstal, Tinneke; Hikavyy, Andriy; Milenin, Alexey; Loo, Roger; Holsteyns, Frank; Horiguchi, Naoto (2018-05) -
Study of Ni-Silicide contacts to Si:C source/drain
Cho, Moon Ju; Nouri, F.; Schreutelkamp, Rob; Kim, Y.; Mertens, Sofie; Verheyen, Peter; Steenbergen, Johnny; Vrancken, Christa; Richard, Olivier; Tokei, Zsolt; Lauwers, Anne; Bender, Hugo; Van Daele, Benny; Vandervorst, Wilfried; Geenen, Luc; Absil, Philippe; Kubicek, Stefan; Demeurisse, Caroline (2007) -
Thin film characterization of PEALD Ru layers on an ALD WNC substrate
Volders, Henny; Tokei, Zsolt; Sinapi, Fabrice; Bender, Hugo; Benedetti, Alessandro; Brijs, Bert; Conard, Thierry; Franquet, Alexis; Steenbergen, Johnny; Travaly, Youssef; Sprey, Hessel; Li, Wei-Min; Shimizu, Akira; Park, Hyung Sang (2007) -
Wafer-scale growth of graphene on Ge and Si wafers by reduced-pressure chemical vapor deposition
Porret, Clément; Nuytten, Thomas; Vanhaeren, Danielle; Steenbergen, Johnny; Brems, Steven; Caymax, Matty; Langer, Robert; Loo, Roger (2016)