Browsing by author "Cheng, Shaunee"
Now showing items 1-20 of 79
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3D Contact hole metrology accuracy and stability
Storms, Greet; Barry, Kelly; Cheng, Shaunee (2005) -
3D features measurement using YieldStar, an angle resolved polarized scatterometer
Charley, Anne-Laure; Leray, Philippe; D'have, Koen; Cheng, Shaunee; Hinnen, Paul; Li, Fahong; Vanoppen, Peter; Dusa, Mircea (2011) -
3D features measurement using Yieldstar, an angle resolved polarized scatterometer
Charley, Anne-Laure; Leray, Philippe; D'have, Koen; Cheng, Shaunee; Hinnen, P.; Li, Fahong; Vanoppen, Peter; Dusa, Mircea (2011) -
90nm technology contact CD performance characterization via ODP scatterometry
Barry, Kelly; Cheng, Shaunee; Storms, Greet (2005) -
A CDU comparison of double-patterning process options using Monte Carlo simulation
Hooge, Joshua; Hatakeyama, Shinichi; Nafus, Kathleen; Scheer, Steven; Foubert, Philippe; Cheng, Shaunee; Leray, Philippe (2009) -
A practical application of multiple parameters profile characterization (MPPC) using CD-SEM on production wafers using Hyper-NA lithography
Ishimoto, Toru; Sekiguchi, Kohei; Hasegawa, Norio; Watanabe, Kenji; Laidler, David; Cheng, Shaunee (2009) -
A single metrology tool solution for complete exposure tool setup
Laidler, David; D'have, Koen; Charley, Anne-Laure; Leray, Philippe; Cheng, Shaunee; Dusa, Mircea; Vanoppen, Peter; Hinnen, Paul (2010) -
Accurate and reliable optical CD of MuGFET down to 10nm
Leray, Philippe; Lorusso, Gian; Cheng, Shaunee; Collaert, Nadine; Jurczak, Gosia; Shirke, S. (2007) -
Achieving optimum diffraction based overlay performance
Leray, Philippe; Laidler, David; Cheng, Shaunee; Coogans, Martyn; Fuchs, Andreas; Ponomarenko, Mariya; van der Schaar, Maurits; Vanoppen, Peter (2010) -
Advanced CD-SEM metrology to improve total process control performance for hyper-NA lithography
Osaki, Mayuka; Tanaka, Maki; Shishido, Chie; Ishimoto, Toru; Hasegawa, Norio; Sekiguchi, Kohei; Watanabe, Kenji; Cheng, Shaunee; Laidler, David; Ercken, Monique; Altamirano Sanchez, Efrain (2008) -
Advanced process control for hyper-NA lithography based on CD-SEM measurement
Ishimoto, Toru; Sekiguchi, K.; Hasegawa, N.; Maeda, T.; Watanabe, K.; Storms, Greet; Laidler, David; Cheng, Shaunee (2007) -
Analysis of the effect of point-of-use filtration on microbridging defectivity
Braggin, Jennifer; Gronheid, Roel; Cheng, Shaunee; Van Den Heuvel, Dieter; Bernard, Sophie; Foubert, Philippe; Rosslee, Craig (2009) -
Application of model-based library approach to photoresist pattern shape measurement in advenced lithography
Yasui, Naoki; Isawa, Miki; Ishimoto, Toru; Sekiguchi, Kohei; Tanaka, Maki; Osaki, Mayuka; Shishido, Chie; Hasegawa, Norio; Cheng, Shaunee (2010) -
Calibration studies of pattern top resist loss detection by CD-SEM for advanced lithography process
Ishimoto, Toru; Isawa, Miki; Tanaka, Maki; Cheng, Shaunee (2011) -
Characterisation of direct alignment for LFLE process
Laidler, David; Leray, Philippe; Cheng, Shaunee; Doytcheva, Maya; Tenner, Manfred; van Haren, Richard (2009) -
Characterization of integrated optical CD for process control
Yu, J.; Uchida, J.; Van Dommelen, Y.; Carpaij, R.; Cheng, Shaunee; Pollentier, Ivan; Viswanathan, A.; Lane, L.; Barry, K.; Jakatdar, N. (2004) -
Characterizing immersion lithography micro bridge defects using advanced features of teh SEMVision G3 STAR FIB
Van Den Heuvel, Dieter; Santoro, Gaetano; Gronheid, Roel; Braggin, Jennifer; Rosslee, Craig; Leray, Philippe; Cheng, Shaunee; Schreutelkamp, Rob; Hillel, Noam (2009) -
Comparison between existing inspection techniques for EUV mask defects
Van Den Heuvel, Dieter; Jonckheere, Rik; Hendrickx, Eric; Cheng, Shaunee; Ronse, Kurt; Abe, Tsukasa; Magana, John; Bret, Tristan (2010) -
Comparison of back side chrome focus monitor to focus self-metrology of an immersion scanner
D'have, Koen; Machida, Takahiro; Laidler, David; Cheng, Shaunee (2007) -
Critical assessment of error budget components in double patterning immersion lithography
Hepp, Birgitt; Finders, Jo; Dusa, Mircea; Vleeming, Bert; Megens, henry; Maenhoudt, Mireille; Cheng, Shaunee; Vandeweyer, Tom (2008)