Browsing by author "Armini, Silvia"
Now showing items 1-20 of 223
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3D stacked IC demonstration using a through silicon via first approach
Van Olmen, Jan; Mercha, Abdelkarim; Katti, Guruprasad; Huyghebaert, Cedric; Van Aelst, Joke; Seppala, Emma; Zhao, Chao; Armini, Silvia; Vaes, Jan; Cotrin Teixeira, Ricardo; Van Cauwenberghe, Marc; Verdonck, Patrick; Verhemeldonck, Koen; Jourdain, Anne; Ruythooren, Wouter; de Potter de ten Broeck, Muriel; Opdebeeck, Ann; Chiarella, Thomas; Parvais, Bertrand; Debusschere, Ingrid; Hoffmann, Thomas Y.; De Wachter, Bart; Dehaene, Wim; Stucchi, Michele; Rakowski, Michal; Soussan, Philippe; Cartuyvels, Rudi; Beyne, Eric; Biesemans, Serge; Swinnen, Bart (2008) -
A First-Principles Investigation of the Driving Forces Defining the Selectivity of TiO2 Atomic Layer Deposition
Kaneda, Yukio; Nye, Rachel; Marques, Esteban; Armini, Silvia; Delabie, Annelies; van Setten, Michiel; Pourtois, Geoffrey (2023) -
Alkanethiolate Self-Assembled Monolayers on Cu: a Density Functional Theory Study of Formation and Phase Behavior
Clerix, Jan-Willem; Sanz-Matias, Ana; Armini, Silvia; Harvey, Jeremy; Delabie, Annelies (2019) -
Application of self assembled monolayers to the electroless metallization of high aspect ratio vias for microelectronics
Bernasconi, Roberto; Hosseini, Molazem; Cervati, Michele; Armini, Silvia; Magagnin, Luca (2016) -
Applications of smart monomolecular films in IC microelectronics for organic-inorganic interface engineering
Armini, Silvia; Herregods, Sebastiaan; Lecordier, Laurent; Verheyen, Claudia; Delande, Tinne; Demeurisse, Caroline; Spampinato, Valentina; Tokei, Zsolt; Struyf, Herbert (2017) -
Area selective grafting of siloxane molecules on low-k dielectric with resepct to copper surface
Rezvanov, Askar; Gornev, E.S.; de Marneffe, Jean-Francois; Armini, Silvia (2019) -
Area-selective ALD of Ru on nanometer-scale Cu lines through dimerization of amino-functionalized alkoxy silane passivation films
Zyulkov, Ivan; Madhivala, Viraj; Voronina, Ekaterina; Snelgrove, Matthew; Bogan, Justin; O'Connor, Rob; De Gendt, Stefan; Armini, Silvia (2020) -
Area-Selective Atomic Layer Deposition of Ru Using Carbonyl-Based Precursor and Oxygen Co-Reactant: Understanding Defect Formation Mechanisms
Lodha, Jayant Kumar; Meersschaut, Johan; Pasquali, Mattia; Billington, Hans; De Gendt, Stefan; Armini, Silvia (2024) -
Area-Selective Atomic Layer Deposition of TiN Using Trimethoxy(octadecyl)silane as a Passivation Layer
Zheng, Li; He, Wei; Spampinato, Valentina; Franquet, Alexis; Sergeant, Stefanie; De Gendt, Stefan; Armini, Silvia (2020) -
Area-selective deposition by a combination of organic film passivation and atomic layer deposition
Pasquali, Mattia; De Gendt, Stefan; Armini, Silvia (2019) -
Area-selective deposition by a combination of organic film passivation and atomic layer deposition
Pasquali, Mattia; De Gendt, Stefan; Armini, Silvia (2019) -
Area-selective deposition by surface engineering for applications in nanoelectronics. From blanket to confined dimensions
Armini, Silvia; Zyulkov, Ivan (2018) -
Area-selective deposition by surface engineering for applications in nanoelectronics. From blanket to confined dimensions
Armini, Silvia; Zyulkov, Ivan; Herregods, Sebastiaan; Struyf, Herbert (2018) -
Area-selective deposition by surface engineering for applications in nanoelectronics. From blanket to confined dimensions
Armini, Silvia; Zyulkov, Ivan; Herregods, Sebastiaan; Struyf, Herbert (2018) -
Area-Selective Deposition of AlOx and Al-Silicate for Fully Self- Aligned Via Integration
Pasquali, Mattia; Brady-Boyd, Anita; Lesniewska, Alicja; Carolan, Patrick; Conard, Thierry; O'Connor, Robert; De Gendt, Stefan; Armini, Silvia (2023) -
Area-selective deposition of low-k materials by means of the sol-gel method
Redzheb, Murad; Pasquali, Mattia; Armini, Silvia (2018) -
Area-selective grafting of siloxane molecules on low-k dielectric with respect to copper surface
Rezvanov, Askar; Zyulkov, Ivan; Gornev, E. S.; de Marneffe, Jean-Francois; Armini, Silvia (2018) -
Area-selective Ru ALD by amorphous carbon modification using H plasma: from atomistic modeling to full wafer process integration
Zyulkov, Ivan; Voronina, Ekaterina; Krishtab, Mikhail; Voloshin, Dmitry; Chan, BT; Mankelevich, Yuri; Rakhimova, Tatyana; Armini, Silvia; De Gendt, Stefan (2020) -
Area-selective Ru-ALD by amorphous carbon modification using H radicals
Zyulkov, Ivan; Voronina,; Voloshin,; Chan, BT; Manchelevich,; Rachimova,; Armini, Silvia; De Gendt, Stefan (2019) -
Bath stability monitoring for electroless Cu seed formation in high aspect ratio TSV
Inoue, Fumihiro; Philipsen, Harold; Armini, Silvia; Radisic, Alex; Civale, Yann; Leunissen, Peter; Shingubara, Shose (2012)