Browsing by author "Rezvanov, Askar"
Now showing items 1-10 of 10
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A Novel Volatile Film for Dielectric Plasma Damage Protection
de Marneffe, Jean-Francois; Rezvanov, Askar; Chanson, Romain; Babaei Gavan, Khashayar; Fujikawa, M.; Yamaguchi, T.; Nozawa, S.; Kikuchi, Y.; Maekawa, K. (2019) -
Area selective grafting of siloxane molecules on low-k dielectric with resepct to copper surface
Rezvanov, Askar; Gornev, E.S.; de Marneffe, Jean-Francois; Armini, Silvia (2019) -
Area-selective grafting of siloxane molecules on low-k dielectric with respect to copper surface
Rezvanov, Askar; Zyulkov, Ivan; Gornev, E. S.; de Marneffe, Jean-Francois; Armini, Silvia (2018) -
Cryogenic etching of porous low-k dielectrics in CF3Br plasma
Rezvanov, Askar; Miakonkikh, A.; Vishnevskiy, A.; Gitshin, O.; Rudenko, K.; Baklanov, Mikhaïl (2016) -
Gas phase pore stuffing for the protection of organo-silicate glass dielectric materials
Fujikawa, Makoto; de Marneffe, Jean-Francois; Chanson, Romain; Babaei Gavan, Khashayar; Rezvanov, Askar; Lazzarino, Frederic; Tokei, Zsolt; Yamaguchi, T.; Nozawa, N.; Sato, Nagisa (2018) -
Gas-phase pore stuffing for low-damage patterning of organo-silicate glass dielectric materials
de Marneffe, Jean-Francois; Fujikawa, T.M.; Yamaguchi, T.; Nozawa, S.; Niino, R.; Sato, N.; Chanson, R.; Babaei Gavan, Khashayar; Rezvanov, Askar; Lazzarino, Frederic; Tokei, Zsolt (2018) -
Low-k protection from F radicals and VUV photons using a multilayer pore grafting approach
Zotovich, Alexey; Rezvanov, Askar; Chanson, Romain; Zhang, L.; Hacker, N.; Kurchikov, K.; Klimin, S.; Zyryanov, S. M.; Lopaev, Dimitri; Gornev, E.; Clemente, I.; Miakonkikh, A.; Maslakov, K. (2018) -
Pore surface grafting of porous low-k dielectrics by selective polymers
Rezvanov, Askar; Zhang, Liping; Watanabe, Mitsuhiro; Hacker, Nigel; Tokei, Zsolt; Boemmels, Juergen; Armini, Silvia; de Marneffe, Jean-Francois (2016) -
Pore surface grafting of porous low-k dielectrics by selective polymers
Rezvanov, Askar; Zhang, Liping; Watanabe, Mitsuhiro; Hacker, Nigel; Kolomeisky, Anatoly; Armini, Silvia; de Marneffe, Jean-Francois (2017) -
Use of a thermally degradable chemical vapor deposited polymer film for low damage plasma processing of highly porous dielectrics
de Marneffe, Jean-Francois; Yamaguchi, Tatsuya; Fujikawa, Makoto; Rezvanov, Askar; Chanson, Romain; Zhang, Jianran; Babaei Gavan, Khashayar; El Otell, Ziad; Nozawa, S.; Kikuchi, Y.; Maekawa, Kaoru (2019)