Browsing by author "Barbarin, Yohan"
Now showing items 1-20 of 28
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As-grown donor-like traps in low-k dielectrics and their impact on intrinsic TDDB reliability
Tang, Baojun; Croes, Kristof; Barbarin, Yohan; Wang, Yunqi; Degraeve, Robin; Li, Yunlong; Toledano Luque, Maria; Kauerauf, Thomas; Boemmels, Juergen; Tokei, Zsolt; De Wolf, Ingrid (2014) -
Characterization of carbon nanotubes based vertical interconnects
Vereecke, Bart; van der Veen, Marleen; Barbarin, Yohan; Masahito, Sugiura; Kashiwagi, Yusaku; Cott, Daire; Huyghebaert, Cedric; Tokei, Zsolt (2012) -
Characterization of metal permeation in porous low-k films by spectroscopic ellipsometry
Kim, Tae-Gon; Verdonck, Patrick; Ciofi, Ivan; Barbarin, Yohan; Tokei, Zsolt; Baklanov, Mikhaïl (2013) -
Correlation between field dependent electrical conduction and dielectric breakdown in a SiOCH based low-k (k=2.0) dielectric
Wu, Chen; Li, Yunlong; Barbarin, Yohan; Ciofi, Ivan; Croes, Kristof; Boemmels, Juergen; De Wolf, Ingrid; Tokei, Zsolt (2013) -
CVD Mn-based self-formed barrier for advanced interconnect technology
Siew, Yong Kong; Jourdan, Nicolas; Barbarin, Yohan; Machillot, Jerome; Demuynck, Steven; Croes, Kristof; Tseng, J.; Ai, Hua; Tang, Jing; Naik, M.; Wang, P.; Narasimhan, M.; Abraham, M.; Cockburn, Andrew; Boemmels, Juergen; Tokei, Zsolt (2013) -
CVD-Mn(Nx) as copper diffusion barrier for advanced interconnect technologies
Jourdan, Nicolas; Machillot, Jerome; Barbarin, Yohan; Siew, Yong Kong; Ai, Hua; Cockburn, Andrew; Nguyen, Mai Phuong; Van Elshocht, Sven; Boemmels, Juergen; Lakshmanan, A.; Ma, Paul; Narasimhan, Murali; Tokei, Zsolt (2013) -
Development and evaluation of a-SiC:H films using a dimethylsilacyclopentane precursor as a low -k Cu capping layer in advanced interconnects
Van Besien, Els; Wang, Cong; Verdonck, Patrick; Singh, Arjun; Barbarin, Yohan; Schaekers, Marc; Baklanov, Mikhaïl; Van Elshocht, Sven (2013) -
Development and evaluation of a-SiCO:H films as Cu and moisture diffusion barriers with a low dielectric constant, for advanced interconnects
Van Besien, Els; Singh, Arjun; Barbarin, Yohan; Verdonck, Patrick; Baklanov, Mikhaïl (2013) -
Electrical improvement of CNT contacts with Cu damascene top metallization
van der Veen, Marleen; Barbarin, Yohan; Vereecke, Bart; Masahito, Sugiura; Kashiwagi, Yusaki; Cott, Daire; Huyghebaert, Cedric; Tokei, Zsolt (2013) -
Electron mean-free path for CNT in vertical interconnects approaches Cu
van der Veen, Marleen; Barbarin, Yohan; Kashiwagi, Yusaku; Tokei, Zsolt (2014) -
Enabling sub 20nm Cu metallization with PEALD Ru-TiN barrier and ELD seed
Siew, Yong Kong; Swerts, Johan; Dictus, Dries; El-Mekki, Zaid; Armini, Silvia; Dordi, Yezdi; Yoon, Alex; Kolics, Artur; Barbarin, Yohan; Croes, Kristof; Boemmels, Juergen; Tokei, Zsolt (2012) -
Enhanced growth and Cu diffusion barrier properties of thermal ALD TaNC films
Wojcik, Henry; Hossbach, Christoph; Kubasch, Christoph; Verdonck, Patrick; Barbarin, Yohan; Merkel, Ulrich; Bartha, Johann; Hubner, Rene; Engelmann, Hans-Jurgen; Friedemann, Michael (2013) -
Growth and integration challenges for carbon nanotubes interconnects
Vanpaemel, Johannes; Masahito, Sugiura; Barbarin, Yohan; De Gendt, Stefan; Tokei, Zsolt; Vereecken, Philippe; van der Veen, Marleen (2014) -
Impact of carbon-doping on time dependent dielectric breakdown of SiO2-based films
Zhao, Larry; Barbarin, Yohan; Croes, Kristof; Baklanov, Mikhaïl; Verdonck, Patrick; Tokei, Zsolt; Claeys, Cor (2015) -
Influence of porosity on dielectric breakdown of ultralow-k dielectrics
Vanstreels, Kris; Ciofi, Ivan; Barbarin, Yohan; Baklanov, Mikhaïl (2013) -
Low field TDDB of BEOL interconnects using >40 months of data
Croes, Kristof; Roussel, Philippe; Barbarin, Yohan; Wu, Chen; Li, Yunlong; Boemmels, Juergen; Tokei, Zsolt (2013) -
Low-k a-SiCO:H films as diffusion barriers for advanced interconnects
Van Besien, Els; Singh, Arjun; Barbarin, Yohan; Verdonck, Patrick; Dekkers, Harold; Vanstreels, Kris; de Marneffe, Jean-Francois; Baklanov, Mikhaïl; Van Elshocht, Sven (2014) -
Optimization of vertical carbon nanotube interconnects using the direct electrical comparison of integration steps
van der Veen, Marleen; Barbarin, Yohan; Boemmels, Juergen; Tokei, Zsolt (2014-11) -
Plasma enhanced chemical vapor deposition of manganese on low-k dielectrics for copper diffusion barrier application
Jourdan, Nicolas; Barbarin, Yohan; Croes, Kristof; Siew, Yong Kong; Van Elshocht, Sven; Tokei, Zsolt; Vancoille, Eric (2013) -
Reliability characteristics of thin porous low-k silica-based interconnect dielectrics
Barbarin, Yohan; Croes, Kristof; Roussel, Philippe; Li, Yunlong; Verdonck, Patrick; Baklanov, Mikhaïl; Tokei, Zsolt; Zhao, Larry (2013)