Browsing by author "Niroomand, Ardavan"
Now showing items 1-20 of 20
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Assessment of EUV resist performance for sub-22nm hp lines and 26nm hp contacts on NXE3100
Goethals, Mieke; Van Roey, Frieda; Hosokawa, Kohei; Hoefnagels, Rik; Niroomand, Ardavan; Foubert, Philippe (2012) -
Design correction in extreme ultrviolet lithography
Fenger, Germain; Lorusso, Gian; Hendrickx, Eric; Niroomand, Ardavan (2010-10) -
EUV lithography program at IMEC
Goethals, Mieke; Jonckheere, Rik; Lorusso, Gian; Hermans, Jan; Van Roey, Frieda; Myers, Alan; Chandhok, Manish; Kim, In Sung; Niroomand, Ardavan; Iwamoto, Fumio; Stepanenko, Nickolay; Gronheid, Roel; Baudemprez, Bart; Ronse, Kurt (2007) -
EUV resist material performance, progress and process improvements at imec
Goethals, Mieke; Niroomand, Ardavan; Ban, Keundo; Hosokawa, Kohei; Van Roey, Frieda; Pollentier, Ivan; Jehoul, Christiane; Van Den Heuvel, Dieter; Ronse, Kurt (2010) -
EUV resist performance update on ADT and NXE:3100 scanner
Goethals, Mieke; Niroomand, Ardavan; Hosokawa, Kohei; Van Roey, Frieda; Pollentier, Ivan; Van Den Heuvel, Dieter (2011) -
EUV resist process development for full field imaging
Niroomand, Ardavan; Goethals, Mieke; Van Roey, Frieda; Kim, Byeong Soo; Lorusso, Gian; Pollentier, Ivan; Jonckheere, Rik; Ronse, Kurt (2007) -
EUV resist process performance investigations on the NXE 3100 full field scanner
Goethals, Mieke; Foubert, Philippe; Hosokawa, Kohei; Van Roey, Frieda; Niroomand, Ardavan; Van Den Heuvel, Dieter; Pollentier, Ivan (2012) -
EUVL at IMEC: shadowing compensation and Flare mitigation
Lorusso, Gian; Goethals, Mieke; Jonckheere, Rik; Hermans, Jan; Ronse, Kurt; Myers, Alan; Kim, In Sung; Niroomand, Ardavan; Iwamoto, Fumio; Ritter, D. (2007-11) -
Feasibility of compensating for EUV field edge effects through OPC
Maloney, Chris; Word, James; Fenger, Germain; Niroomand, Ardavan; Lorusso, Gian; Jonckheere, Rik; Hendrickx, Eric; Smith, Bruce (2014) -
Full chip correction of EUV design
Lorusso, Gian; Hendrickx, Eric; Fenger, Germain; Niroomand, Ardavan (2010) -
Full field EUV lithography turning into reality at IMEC
Jonckheere, Rik; Lorusso, Gian; Goethals, Mieke; Hermans, Jan; Baudemprez, Bart; Myers, Alan; Kim, In Sung; Niroomand, Ardavan; Iwamoto, Fumio; Stepanenko, Nickolay; Ronse, Kurt (2007) -
Full field EUV lithography: lessons learnt on EUV ADT imaging, EUV resist, and EUV reticles
Hendrickx, Eric; Goethals, Mieke; Niroomand, Ardavan; Jonckheere, Rik; Van Roey, Frieda; Lorusso, Gian; Hermans, Jan; Baudemprez, Bart; Ronse, Kurt (2008) -
Imaging performance of the EUV alpha demo tool at IMEC
Lorusso, Gian; Hermans, Jan; Goethals, Mieke; Baudemprez, Bart; Van Roey, Frieda; Myers, Alan; Kim, In Sung; Kim, Byeong Soo; Jonckheere, Rik; Niroomand, Ardavan; Lok, E.; Van Dijk, A.; de Marneffe, Jean-Francois; Demuynck, Steven; Goossens, Danny; Ronse, Kurt (2008) -
Implementing full field EUV lithography using the ADT
Goethals, Mieke; Hendrickx, Eric; Jonckheere, Rik; Lorusso, Gian; Baudemprez, Bart; Hermans, Jan; Laidler, David; Niroomand, Ardavan; Van Roey, Frieda; van Dijk, Andre; Romijn, Leon; Stepanenko, Nickolay; Timoshkov, Vadim; Iwamoto, Fumio; Myers, Alan; Hyun, Yoonsuk; Lim, Changmoon; Pollentier, Ivan; Leeson, Michael; de Marneffe, Jean-Francois; Demuynck, Steven; Ronse, Kurt (2008) -
Progress in full field EUV lithography program at IMEC
Goethals, Mieke; Lorusso, Gian; Jonckheere, Rik; Baudemprez, Bart; Hermans, Jan; Iwamoto, Fumio; Kim, Byeong Soo; Kim, In Sung; Myers, Alan; Niroomand, Ardavan; Stepanenko, Nickolay; Van Roey, Frieda; Pollentier, Ivan; Ronse, Kurt (2007) -
Recent advancements in EUV resist materials and process performance
Goethals, Mieke; Niroomand, Ardavan; Van Roey, Frieda; Hosokawa, Kohei; Pollentier, Ivan (2011) -
Resist process development for the EUV alpha demo tool at IMEC
Goethals, Mieke; Niroomand, Ardavan; Van Roey, Frieda; Hermans, Jan; Lorusso, Gian; Baudemprez, Bart; Pollentier, Ivan; de Marneffe, Jean-Francois; Demuynck, Steven; Jonckheere, Rik; Ronse, Kurt (2008) -
Status of ArF lithography for the 130nm technology node
Ronse, Kurt; Vandenberghe, Geert; Jaenen, Patrick; Delvaux, Christie; Vangoidsenhoven, Diziana; Van Roey, Frieda; Pollers, Ingrid; Maenhoudt, Mireille; Goethals, Mieke; Pollentier, Ivan; Vleeming, Bert; van Ingen Schenau, K.; Heskamp, B.; Davies, G.; Finders, Jo; Niroomand, Ardavan (2000) -
Status of EUV lithography at IMEC
Goethals, Mieke; Jonckheere, Rik; Lorusso, Gian; Hermans, Jan; Van Roey, Frieda; Myers, Alan; Kim, In Sung; Niroomand, Ardavan; Iwamoto, Fumio; Stepanenko, Nickolay; Ronse, Kurt (2007) -
Towards manufacturing a 10nm node device with complementary EUV lithography
Hermans, Jan; Dai, Huixiong; Niroomand, Ardavan; Laidler, David; Mao, Ming; Chen, Yongmei; Leray, Philippe; Ngai, Chris; Cheng, Shaunee (2013)