Browsing by author "Leeson, Michael"

Advances in process optimization for dual-tone development as a double patterning technique

Fonseca, Carlos; Somervell, Mark; Bernard, Sophie; Hatakeyama, Shinichi; Nafus, Kathleen; Leeson, Michael; Scheer, Steven; Gronheid, Roel (2008)

Characterisation of EUV resist related outgassing and contamination

Pollentier, Ivan; Berger, Margaux; Goethals, Mieke; Gronheid, Roel; Leeson, Michael (2009)

Compensation of overlay errors due to mask bending and non-flatness for EUV masks

Chandhok, Manish; Goyal, Sanjay; Carson, Steve; Park, Seh-Jin; Zhang, Guojing; Myers, Alan; Leeson, Michael; Kamna, Marilyn; Martinez, Fabian; Stivers, Alan; Lorusso, Gian; Hermans, Jan; Hendrickx, Eric; Govindjee, Sanjay; Brandstetter, Gerd; Laursen, Tod (2009)

Development of non-chemically amplified photoresists for extreme ultraviolet (EUV) lithography

Lawrie, Kirsten; Blakey, Idriss; Blinco, James; Gronheid, Roel; Jack, Kevin; Pollentier, Ivan; Leeson, Michael; Younkin, Todd R.; Whittaker, Andrew K. (2009)

EUV resist requirements: absorbance and acid yield

Gronheid, Roel; Fonseca, Carlos; Leeson, Michael; Adams, Jacob; Strahan, Jeff; Willson, C. Grant; Smith, Bruce W. (2009)

EUV secondary electron blur at the 22nm half pitch node

Gronheid, Roel; Younkin, Todd; Leeson, Michael; Fonseca, Carlos; Hooge, Joshua; Nafus, Kathleen; Biafore, John; Smith, Mark D. (2011)

Evidence of speckle in extreme-UV lithography

Vaglio Pret, Alessandro; Gronheid, Roel; Engelen, Jan; Pei-Yang, Yan; Leeson, Michael; Younkin, Todd (2012-10)

Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s: towards applications as EUV photoresists

Lawrie, Kirsten; Blakey, Idriss; Blinco, James; Gronheid, Roel; Jack, Kevin; Pollentier, Ivan; Leeson, Michael; Younkin, Todd; Whittaker, Andrew K. (2011)

Extreme ultraviolet interference lithography as applied to photoresist studies

Gronheid, Roel; Leeson, Michael (2009)

Feasibility study on dual tone development for frequency doubling

Bernard, Sophie; Fonseca, Carlos; Gronheid, Roel; Hatakeyama, Shinichi; Leeson, Michael; Nafus, Kathleen; Scheer, Steven; Somervell, Marc (2008)

Impact of EUV mask surface roughness on LER

Vaglio Pret, Alessandro; Gronheid, Roel; Younkin, Todd; Leeson, Michael; Yan, Pei-Yang (2012)

Impact of extreme UV mask flatness on resist roughness

Vaglio Pret, Alessandro; Gronheid, Roel; Younkin, Todd; Leeson, Michael; Pei-Yang, Yan (2012)

Implementing full field EUV lithography using the ADT

Goethals, Mieke; Hendrickx, Eric; Jonckheere, Rik; Lorusso, Gian; Baudemprez, Bart; Hermans, Jan; Laidler, David; Niroomand, Ardavan; Van Roey, Frieda; van Dijk, Andre; Romijn, Leon; Stepanenko, Nickolay; Timoshkov, Vadim; Iwamoto, Fumio; Myers, Alan; Hyun, Yoonsuk; Lim, Changmoon; Pollentier, Ivan; Leeson, Michael; de Marneffe, Jean-Francois; Demuynck, Steven; Ronse, Kurt (2008)