Browsing by author "Nakajima, K."
Now showing items 1-12 of 12
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Advanced characterization of high-K materials: a nuclear approach
Brijs, Bert; Huyghebaert, Cedric; Nauwelaerts, Sophie; Caymax, Matty; Vandervorst, Wilfried; Nakajima, K.; Kimura, K.; Bergmaier, A.; Dollinger, G.; Lennard, W. N.; Terwagne, G.; Vantomme, Andre (2002) -
Advanced RBS analysis of thin films in micro-electronics
Brijs, Bert; Deleu, Jeroen; Huyghebaert, Cedric; Nauwelaerts, Sophie; Nakajima, K.; Kimura, K.; Vandervorst, Wilfried (2001) -
Characterization of ultra thin layers by Rutherford backscattering spectrometry
Brijs, Bert; Deleu, Jeroen; Conard, Thierry; Li, H.; Loo, Roger; Caymax, Matty; Nakajima, K.; Kimura, K.; Vandervorst, Wilfried (1999) -
Characterization of ultra thin oxynitrides, a general approach
Brijs, Bert; Deleu, Jeroen; Conard, Thierry; De Witte, Hilde; Vandervorst, Wilfried; Nakajima, K.; Kimura, K.; Genchev, I.; Bergmaier, A.; Goergens, I.; Neumaier, P.; Dollinger, G.; Dobeli, M. (1999) -
Characterization of ultra thin oxynitrides: a general approach
Brijs, Bert; Deleu, Jeroen; Conard, Thierry; De Witte, Hilde; Vandervorst, Wilfried; Nakajima, K.; Kimura, K.; Genchev, I.; Bermaier, A.; Goergens, L.; Neumaier, P.; Dollinger, G.; Döbeli, M. (2000) -
Cluster effect on projected range of 30 keV C60+ in silicon
Morita, Y.; Nakajima, K.; Suzuki, M.; Saitoh, Y.; Vandervorst, Wilfried; Kimura, K. (2011) -
Comparative growth kinetics of SiGe in a commercial reduced pressure chemical vapour deposition EPI reactor and anomalies during growth of thin Si layers on SiGe
Caymax, Matty; Loo, Roger; Brijs, Bert; Vandervorst, Wilfried; Howard, Dave; Kimura, K.; Nakajima, K. (1998) -
Does NIST database provide reliable effective attenuation lenght for XPS analysis
Nakajima, K.; Kimura, Kenji; Conard, Thierry; Vandervorst, Wilfried (2007) -
EXLE-SIMS: dramatically enhanced accuracy for dose loss metrology
Vandervorst, Wilfried; Vos, Rita; Salima, A.J.; Merkulov, A.; Nakajima, K.; Kimura, K. (2008) -
Quantification and depth profiling of a ZrO2 (2nm)/A1203 (1nm) layer with NRA, RBS, HRBS, HERD
Brijs, Bert; Huyghebaert, Cedric; Nauwelaerts, Sophie; Caymax, Matty; Vandervorst, Wilfried; Nakajima, K.; Kimura, K.; Bergmaier, A.; Dollinger, G.; Lennard, W. N.; Terwagne, G.; Vantomme, Andre (2001) -
Recent developments in nuclear methods in support of semiconductor characterization
Brijs, Bert; Bender, Hugo; Huyghebaert, Cedric; Janssens, Tom; Vandervorst, Wilfried; Nakajima, K.; Kimura, K.; Bergmaier, A.; Dollinger, G.; van den Berg, J.A. (2003) -
Removal of small (<100-nm) particles and metal contamination in single-wafer cleaning tool
Eitoku, Atsuro; Snow, Jim; Vos, Rita; Sato, M.; Hirae, S.; Nakajima, K.; Nonomura, M.; Imai, M.; Mertens, Paul; Heyns, Marc (2003)