Browsing by author "Wolke, K."
Now showing items 1-18 of 18
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Advanced cleaning and ultra-thin oxide technology
Heyns, Marc; Cornelissen, Ingrid; De Gendt, Stefan; Degraeve, Robin; Knotter, D. M.; Mertens, Paul; Mertens, S.; Meuris, Marc; Nigam, Tanya; Rotondaro, Antonio; Schaekers, Marc; Teerlinck, Ivo; Vos, Rita; Wolke, K. (1998) -
Advanced cleaning strategies for ultra-clean silicon surfaces
Heyns, Marc; Bearda, Twan; Cornelissen, Ingrid; De Gendt, Stefan; Loewenstein, Lee; Mertens, Paul; Mertens, Sofie; Meuris, Marc; Schaekers, Marc; Teerlinck, Ivo; Vos, Rita; Wolke, K. (1999) -
Advanced single chemistry alkaline cleaning in a STEAG single tank tool
Onsia, Bart; Schellkes, E.; Vos, Rita; De Gendt, Stefan; Doll, O.; Fester, A.; Kolbesen, B. O.; Hoffman, M.; Hatcher, Z.; Wolke, K.; Mertens, Paul; Heyns, Marc (2001) -
Advanced single chemistry alkaline cleaning in a STEAG single tank tool
Onsia, Bart; Schellkes, E.; Vos, Rita; De Gendt, Stefan; Doll, O.; Fester, A.; Kolbesen, B.; Hoffman, M.; Hatcher, Z.; Wolke, K.; Mertens, Paul; Heyns, Marc (2002) -
Advances in understanding wet cleaning technology and the effect of metal contamination
Heyns, Marc; Bearda, Twan; Cornelissen, Ingrid; De Gendt, Stefan; Loewenstein, Lee; Mertens, Paul; Mertens, S.; Meuris, Marc; Schaekers, Marc; Teerlinck, Ivo; Vos, Rita; Wolke, K. (1999) -
Application of moist ozone gas phase for removal of resist and organic contamination in a novel tank type processor
Wolke, K.; Riedel, T.; Haug, Rainer; De Gendt, Stefan; Heyns, Marc; Meuris, Marc (2000) -
Application of moist ozone gasphase for removal of resist and organic contamination in a novel tank-type processor
Haug, Rainer; Cornelissen, Ingrid; Claes, Martine; De Gendt, Stefan; Wolke, K.; Meuris, Marc; Heyns, Marc (1999) -
Comparison of RCA and IMEC clean (HF last) type cleaning sequences in full production environment
Wolke, K.; Schenkl, M.; Silvestre, P.; Bellandi, E.; Alessandri, M.; Cornelissen, Ingrid; Meuris, Marc (1996) -
Cost-effective cleaning and high-quality thin gate oxides
Heyns, Marc; Bearda, Twan; Cornelissen, Ingrid; De Gendt, Stefan; Degraeve, Robin; Groeseneken, Guido; Kenens, Conny; Knotter, D. M.; Loewenstein, Lee; Mertens, Paul; Mertens, S.; Meuris, Marc; Nigam, Tanya; Schaekers, Marc; Teerlinck, Ivo; Vandervorst, Wilfried; Vos, Rita; Wolke, K. (1999) -
Developments in cleaning technology for critical layers
Heyns, Marc; Arnauts, Sophia; Bearda, Twan; Claes, M.; Cornelissen, Ingrid; De Gendt, Stefan; Doumen, Geert; Fyen, Wim; Loewenstein, Lee; Lux, Marcel; Mertens, Paul; Mertens, S.; Meuris, Marc; Onsia, Bart; Röhr, Erika; Schaekers, Marc; Teerlinck, Ivo; Van Doorne, Patrick; Van Hoeymissen, Jan; Vereecke, Guy; Vos, Rita; Wolke, K. (2000) -
From Piranha to Barracuda: mechanism of ozone and water vapor photoresistant strip in a wet bench
Riedel, T.; Wolke, K.; De Gendt, Stefan; Onsia, Bart (2001) -
Implementation of the IMEC-Clean in advanced CMOS manufacturing
Meuris, Marc; Arnauts, Sophia; Cornelissen, Ingrid; Kenis, Karine; Lux, Marcel; De Gendt, Stefan; Mertens, Paul; Teerlinck, Ivo; Vos, Rita; Loewenstein, Lee; Heyns, Marc; Wolke, K. (1999) -
New technologies for reducing chemical costs and environmental impact
Heyns, Marc; Cornelissen, Ingrid; Mertens, Paul; Mertens, S.; Meuris, Marc; Rotondaro, Antonio; Schaekers, Marc; Teerlinck, Ivo; Vos, Rita; Wolke, K. (1998) -
Optimized insitu rinsing for HF last processes
Wolke, K.; Kübelbeck, A.; Cornelissen, Ingrid; Meuris, Marc; Oshinowo, J. (1997) -
Ozonated DI-water for clean chemical oxide growth
Cornelissen, Ingrid; Meuris, Marc; Wolke, K.; Wilkol, M.; Loewenstein, Lee; Doumen, Geert; Heyns, Marc (1998) -
Ozonated DI-water for clean chemical oxide growth
Cornelissen, Ingrid; Meuris, Marc; Wolke, K.; Wilkol, M.; Loewenstein, Lee; Doumen, Geert; Heyns, Marc (1999) -
The IMEC-Clean: A clean for advanced CMOS manufacturing
Meuris, Marc; Arnauts, Sophia; Cornelissen, Ingrid; Kenis, Karine; Lux, Marcel; De Gendt, Stefan; Mertens, Paul; Teerlinck, Ivo; Vos, Rita; Loewenstein, Lee; Heyns, Marc; Wolke, K. (2000) -
Ultra thin gate oxide technology and reliability
Heyns, Marc; Depas, Michel; Teerlinck, Ivo; Meuris, Marc; Mertens, Paul; Vanhellemont, Jan; Mouche, Laurent; Nigam, Tanya; Wilhelm, Rudi; Knotter, Martin; Wolke, K.; Crossley, A.; Sofield, C. J.; Gräf, D. (1996)