Browsing by author "Tillocher, T."
Now showing items 1-9 of 9
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Applications of cryogenic plasma etching for microtechnology and advanced CMOS manufacturing
Dussart, R.; Lefaucheux, P.; Tillocher, T.; Ranson, P.; Boufnichel, M.; Ljazouli, R.; Zhang, Liping; Mankelevich, Y.; de Marneffe, Jean-Francois; De Gendt, Stefan; Baklanov, Mikhaïl (2013) -
Cryoetching of silicon and advanced materials for 3D interconnects
Dussart, R.; Tillocher, T.; Gosset, N; Lefaucheux, P.; L'jazouli, R; Boufnichel, M.; Zhang, Liping; de Marneffe, Jean-Francois; Baklanov, Mikhaïl; Nishimura, E; Yatsuda, K; Maekawa, K (2014) -
Cryogenic etching of porous organosilicate low-k materials: reduction of plasma induced damage
Leroy, F.; Tillocher, T.; Zhang, Liping; Lefaucheux, P.; Yatsuda, K.; Maekawa, K.; de Marneffe, Jean-Francois; Baklanov, Mikhaïl; Dussart, R (2015) -
Cryogenic etching processes applied to porous low-k materials using C4F8/SF6 plasmas
Leroy, F.; Zhang, Liping; Tillocher, T.; Yatsuda, K.; Maekawa, K; Nishimura, E; Lefaucheux, P; de Marneffe, Jean-Francois; Baklanov, Mikhaïl; Dussart, R (2015) -
CVD of phosphorus-doped diamond: growth and characterisation
Barjon, J.; Pinault, M.A.; Tillocher, T.; Frangieh, G.; Kobor, D.; Chikoidze, E.; Jomard, F.; Chevallier, J.; Lazea, A.; Haenen, Ken (2009) -
Damage free cryogenic etching of a porous organosilica ultralow-k film
Zhang, Liping; Leffaucheux, P.; Tillocher, T.; Dussart, R.; Mankelevich, Y.; de Marneffe, Jean-Francois; De Gendt, Stefan; Baklanov, Mikhaïl (2013) -
Low-k cryo-etching : comparison of four different High Boiling Point Organic (HBPO)
Chanson, Romain; Lefaucheux, P.L.; Dussart, R.; Tillocher, T.; Shen, P.; Urabe, K.; Dussarat, C.; Maekawa, K.; Yatsuda, K.; Tahara, S.; de Marneffe, Jean-Francois (2017) -
Plasma cryoetching processes for silicon and advanced materials
Dussart, R.; Tillocher, T.; Gosset, N.; Vital, A; Lefaucheux, P.; L'jazouli, R; Boufnichel, M.; Vayer, M.; Sinturel, C.; Zhang, Liping; de Marneffe, Jean-Francois; Baklanov, Mikhaïl; Nishimura, E.; Yatsuda, K.; Maekawa, K. (2014) -
Reduction of plasma induced damage of porous low-k materials using a cryogenic etching process
Tillocher, T.; Leroy, F.; Zhang, Liping; Lefaucheux, P.; Yatsuda, K.; Maekawa, K.; de Marneffe, Jean-Francois; Baklanov, Mikhaïl; Dussart, R. (2015)