Browsing by author "Li, Zilan"
Now showing items 1-13 of 13
-
Effective metal gate work function modification by ion implantation with W-based gate stack
Li, Zilan; Schram, Tom; Kerner, Christoph; Witters, Thomas; Singanamalla, Raghunath; Pourtois, Geoffrey; Paraschiv, Vasile; Hoffmann, Thomas Y.; Rohr, Erika; Absil, Philippe; De Gendt, Stefan; De Meyer, Kristin (2008) -
Energy band-alignment of a multimetal-layer gated metal-oxide-semiconductor structure
Li, Zilan; Houssa, Michel; Schram, Tom; De Gendt, Stefan; De Meyer, Kristin (2009) -
Flat-band voltage shift of Ruthenium gated stacks and its link with the formation of a thin Ruthenium oxide layer at the Ruthenium/dielectric interface
Li, Zilan; Schram, Tom; Pantisano, Luigi; Stesmans, Andre; Conard, Thierry; Shamuilia, Sheron; Afanasiev, Valeri; Akheyar, Amal; Van Elshocht, Sven; Brunco, David; Deweerd, Wim; Naoki, Yamada; Lehnen, Peer; De Gendt, Stefan; De Meyer, Kristin (2007-02) -
Forming gas anneal induced flat-band voltage shift of metal-oxide-semiconductor stacks and its link with hydrogen incorporation in metal gates
Li, Zilan; Schram, Tom; Pantisano, Luigi; Witters, Thomas; Stesmans, Andre; Akheyar, Amal; Afanasiev, Valeri; Yamada, Naoki; Tsunoda, Takaaki; De Gendt, Stefan; De Meyer, Kristin (2007) -
Influence of metal capping layer on the work function of Mo gated metal-oxide semiconductor stacks
Li, Zilan; Schram, Tom; Stesmans, Andre; Franquet, Alexis; Witters, Thomas; Pantisano, Luigi; Yamada, Naoki; Tsunoda, Takaaki; Hooker, Jacob; De Gendt, Stefan; De Meyer, Kristin (2008) -
Investigation on molybdenum and its conductive oxides as p-type metal gate candidates
Li, Zilan; Schram, Tom; Witters, Thomas; Cho, Hag-Ju; O'Sullivan, Barry; Yamada, Naoki; Tsunoda, Takaaki; Hooker, Jacob; De Gendt, Stefan; De Meyer, Kristin (2008) -
Investigation on molybdenum and its conductive oxides as p-type metal gate candidates
Li, Zilan; Schram, Tom; Witters, Thomas; Cho, Hag-Ju; O'Sullivan, Barry; Hooker, Jacob; De Gendt, Stefan; De Meyer, Kristin (2007) -
Mechanism of O2-anneal induced Vfb shifts of Ru gated stacks
Li, Zilan; Schram, Tom; Pantisano, Luigi; Stesmans, Andre; Conard, Thierry; Shamuilia, Sheron; Afanasiev, Valeri; Akheyar, Amal; Van Elshocht, Sven; Brunco, David; Deweerd, Wim; Naoki, Yamada; Lehnen, Peer; De Gendt, Stefan; De Meyer, Kristin (2007) -
Metal gate work function control for advanced MOSFET applications
Li, Zilan (2009-09) -
Oxygen incorporation in TiN for metal gate work function tuning with a replacement gate integration approach
Li, Zilan; Schram, Tom; Witters, Thomas; Tseng, Joshua; De Gendt, Stefan; De Meyer, Kristin (2010) -
Substrate transfer of GaN-LED on 200mm Si wafer
Pham, Nga; Rosmeulen, Maarten; Li, Zilan; Sabuncuoglu Tezcan, Deniz; Osman, Haris (2013) -
Surface termination of HfO2 in W/HfO2 gated metal-oxide-semiconductor stacks from thermal stability point of view
Li, Zilan; Pourtois, Geoffrey; Schram, Tom; De Gendt, Stefan; De Meyer, Kristin (2008) -
Ultra low-EOT (5 Å) gate-first and gate-last high performance CMOS achieved by gate-electrode optimization
Ragnarsson, Lars-Ake; Li, Zilan; Tseng, Joshua; Schram, Tom; Rohr, Erika; Cho, Moon Ju; Kauerauf, Thomas; Conard, Thierry; Okuno, Y.; Parvais, Bertrand; Absil, Philippe; Biesemans, Serge; Hoffmann, Thomas Y. (2009)