Browsing by author "D'Urzo, Lucia"
Now showing items 1-12 of 12
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Capture probability of assembly defects in 14 nm half-pitch line/space DSA patterns
Pathangi Sriraman, Hari; Chan, BT; Van Look, Lieve; Vandenbroeck, Nadia; Van Den Heuvel, Dieter; Cross, Andrew; Hong, Sung Eun; Nafus, Kathleen; D'Urzo, Lucia; Gronheid, Roel (2015) -
Continuous improvements of defectivity rates in immersion photolithography via functionalized membranes in point-of-use photochemical filtration
D'Urzo, Lucia; Bayana, Hareen; Vandereyken, Jelle; Foubert, Philippe; Wu, Aiwen; Jaber, Jad; Hamzik, James (2017) -
Defect capture sensitivity in 14 nm half-pitch line/space DSA patterns
Pathangi Sriraman, Hari; Gronheid, Roel; Van Den Heuvel, Dieter; Rincon Delgadillo, Paulina; Chan, BT; Van Look, Lieve; Bayana, Hareen; Cao, Yi; Her, YoungJun; Lin, Guanyang; Parnell, Doni; Nafus, Kathleen; Somervell, Mark; Harukawa, Ryoto; Chikashi, Ito; Nagaswami, Venkat; D'Urzo, Lucia; Nealey, Paul (2014) -
Defect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow
Pathangi Sriraman, Hari; Chan, BT; Bayana, Hareen; Vandenbroeck, Nadia; Van Den Heuvel, Dieter; Van Look, Lieve; Rincon Delgadillo, Paulina; Cao, Yi; Kim, JiHoon; Lin, Guanyang; Parnell, Doni; Nafus, Kathleen; Harukawa, Ryota; Chikashi, Ito; Polli, Marco; D'Urzo, Lucia; Gronheid, Roel; Nealey, Paul (2015) -
Defect mitigation and root cause studies in imec's 14 nm half-pitch chemo-epitaxy DSA flow
Pathangi Sriraman, Hari; Chan, BT; Bayana, Hareen; Van Den Heuvel, Dieter; Van Look, Lieve; Rincon Delgadillo, Paulina; Cao, Yi; Kim, YiHoon; Lin, G.; Parnell, Doni; Nafus, Kathleen; Harukawa, Ryoto; Chikashi, Ito; Nagaswami, Venkat; D'Urzo, Lucia; Gronheid, Roel; Nealey, Paul (2015) -
Defect reduction and defect stability in imec's 14nm half pitch chemo-epitaxy DSA flow
Gronheid, Roel; Rincon Delgadillo, Paulina; Pathangi Sriraman, Hari; Van Den Heuvel, Dieter; Parnell, Doni; Chan, BT; Lee, Yu-tsung; Van Look, Lieve; Cao, Yi; Her, YoungJun; Lin, Guanyang; Harukawa, Ryoto; Nagaswami, Venkat; D'Urzo, Lucia; Somervell, Mark; Nealey, Paul (2014) -
Defectivity modulation in EUV resists through advanced filtration technologies
D'Urzo, Lucia; Umeda, T.; Mizuno, T.; Hattori, A.; Varanasi, R.; Singh, A.; Beera, R.; Foubert, Philippe; Vandereyken, Jelle; Drent, Waut (2020) -
Defectivity study on dry development rinse process (DDRP)
Stokes, Harold; De Simone, Danilo; Thouroude, Yan; D'Urzo, Lucia; Sayan, Safak; Foubert, Philippe (2015) -
DSA materials contributions to the defectivity performance of the 14nm half-pitch LiNe flow @ imec
Pathangi Sriraman, Hari; Vaid, Varun; Chan, BT; Vandenbroeck, Nadia; Li, Jin; Hong, Sung Eun; Cao, Yi; Durairaj, Baskaran; Lin, Guanyang; Somervell, Mark; Kitano, Takahiro; Harukawa, Ryota; Sah, Kaushik; Cross, Andrew; Bayana, Hareen; D'Urzo, Lucia; Gronheid, Roel (2016) -
High volume manufacturing compatible dry development rinse process (DDRP): patterning and defectivity performance for EUVL
Sayan, Safak; Vanelderen, Pieter; Hetel, Iulian; Chan, BT; Raghavan, Praveen; Blanco, Victor; Foubert, Philippe; D'Urzo, Lucia; De Simone, Danilo; Vandenberghe, Geert (2017) -
Point-of-use filtration strategy for negative tone developer in extended immersion and extreme-ultraviolet (EUV) lithography
D'Urzo, Lucia; Foubert, Philippe; Stokes, Harold; Thouroude, Yan; Xia, A.; Wu, A. (2015) -
Use of a purged FOUP to improve H-terminated silicon surface stability prior to epitaxial growth
Wostyn, Kurt; Rondas, Dirk; Kenis, Karine; Loo, Roger; Hikavyy, Andriy; Douhard, Bastien; Mertens, Paul; Holsteyns, Frank; De Gendt, Stefan; D'Urzo, Lucia; Van Autryve, Luc (2014)