Browsing by author "Poliakov, Pavel"
Now showing items 1-13 of 13
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Bridging lithography processes with NAND flash ECC complexity
Poliakov, Pavel; Blomme, Pieter; Vaglio Pret, Alessandro; Miranda Corbalan, Miguel; Van Houdt, Jan; Dehaene, Wim (2011-06) -
Circuit design for bas compatibility in novel FinFET-based floating body RAM
Poliakov, Pavel; Anchlia, Ankur; Garcia Bardon, Marie; Rooseleer, Bram; De Wachter, Bart; Collaert, Nadine; van der Zanden, Koen; Dehaene, Wim; Verkest, Diederik; Miranda Corbalan, Miguel (2010) -
Circuit design for bias compatibility investigation of bulk FinFET based floating body RAM
Anchlia, Ankur; Garcia Bardon, Marie; Poliakov, Pavel; Rooseleer, Bram; De Wachter, Bart; Collaert, Nadine; van der Zanden, Koen; Miranda Corbalan, Miguel; Dehaene, Wim; Verkest, Diederik (2009) -
Cross-cell interference variability aware model of fully planar NAND Flash memory including line edge roughness
Poliakov, Pavel; Blomme, Pieter; Miranda Corbalan, Miguel; Van Houdt, Jan; Dehaene, Wim (2011-05) -
Impact of EUV lithography line edge roughness on 16 nm memory generation
Vaglio Pret, Alessandro; Poliakov, Pavel; Bianchi, Davide; Gronheid, Roel; Blomme, Pieter; Miranda Corbalan, Miguel; Van Houdt, Jan; Dehaene, Wim (2011) -
Impact of line edge roughness on cell-to-cell coupling variability in NAND flash arrays
Poliakov, Pavel; Blomme, Pieter; Miranda Corbalan, Miguel; Anchlia, Ankur; Dobrovolny, Petr; Brusamarello, Lucas; Stucchi, Michele; Van Houdt, Jan; Dehaene, Wim (2010-03) -
Induced variability of cell-to-cell interference by line edge roughness in nand flash arrays
Poliakov, Pavel; Blomme, Pieter; Vaglio Pret, Alessandro; Miranda Corbalan, Miguel; Gronheid, Roel; Verkest, Diederik; Van Houdt, Jan; Dehaene, Wim (2012) -
Linking EUV lithography line edge roughness and 16 nm NAND memory performance
Vaglio Pret, Alessandro; Poliakov, Pavel; Gronheid, Roel; Blomme, Pieter; Miranda Corbalan, Miguel; Dehaene, Wim; Verkest, Diederik; Van Houdt, Jan; Bianchi, Davide (2012) -
Modeling and exploration of novel non-volatile memory technologies
Poliakov, Pavel (2012-09) -
Roughness analysis for (EUV) optical lithography
Vaglio Pret, Alessandro; Poliakov, Pavel; Bianche, Davide; Gronheid, Roel; Blomme, Pieter; Miranda Corbalan, Miguel; Van Houdt, Jan; Dehaene, Wim (2010) -
Spacer-defined EUV lithography reducing variability of 12nm NAND Flash memories
Poliakov, Pavel; Blomme, Pieter; Vaglio Pret, Alessandro; Miranda Corbalan, Miguel; Gronheid, Roel; Wiaux, Vincent; Versluijs, Janko; Verkest, Diederik; Van Houdt, Jan; Dehaene, Wim (2012) -
Trades-off between line edge roughness and error-correcting codes requirements for NAND Flash Memories
Poliakov, Pavel; Blomme, Pieter; Vaglio Pret, Alessandro; Miranda Corbalan, Miguel; Gronheid, Roel; Verkest, Diederik; Van Houdt, Jan; Dehaene, Wim (2012) -
Variability aware modeling of SoCs: from device variations to manufactured system yield
Miranda Corbalan, Miguel; Dierickx, Bart; Zuber, Paul; Dobrovolny, Petr; Kutscherauer, Florian; Roussel, Philippe; Poliakov, Pavel (2009)