Browsing by author "Ishimoto, Toru"
Now showing items 1-15 of 15
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A practical application of multiple parameters profile characterization (MPPC) using CD-SEM on production wafers using Hyper-NA lithography
Ishimoto, Toru; Sekiguchi, Kohei; Hasegawa, Norio; Watanabe, Kenji; Laidler, David; Cheng, Shaunee (2009) -
Advanced CD-SEM metrology to improve total process control performance for hyper-NA lithography
Osaki, Mayuka; Tanaka, Maki; Shishido, Chie; Ishimoto, Toru; Hasegawa, Norio; Sekiguchi, Kohei; Watanabe, Kenji; Cheng, Shaunee; Laidler, David; Ercken, Monique; Altamirano Sanchez, Efrain (2008) -
Advanced process control for hyper-NA lithography based on CD-SEM measurement
Ishimoto, Toru; Sekiguchi, K.; Hasegawa, N.; Maeda, T.; Watanabe, K.; Storms, Greet; Laidler, David; Cheng, Shaunee (2007) -
Application of model-based library approach to photoresist pattern shape measurement in advenced lithography
Yasui, Naoki; Isawa, Miki; Ishimoto, Toru; Sekiguchi, Kohei; Tanaka, Maki; Osaki, Mayuka; Shishido, Chie; Hasegawa, Norio; Cheng, Shaunee (2010) -
Calibration studies of pattern top resist loss detection by CD-SEM for advanced lithography process
Ishimoto, Toru; Isawa, Miki; Tanaka, Maki; Cheng, Shaunee (2011) -
Contour-based metrology for complex 2D shaped patterns printed by multiple-patterning process
Fuchimoto, Daisuke; Ishimoto, Toru; Hiroyuki, Shindo; Sugahara, Hitoshi; Toyoda, Yasutaka; Mailfert, Julien; De Bisschop, Peter (2014) -
Enabling CD SEM metrology for 5nm technology node and beyond
Lorusso, Gian; Ohashi, Takeyoshi; Yamaguchi, Astuko; Inoue, Osamu; Sutani, Takumichi; Horiguchi, Naoto; Boemmels, Juergen; Wilson, Chris; Briggs, Basoene; Tan, Chi Lim; Raymaekers, Tom; Delhougne, Romain; Van den Bosch, Geert; Di Piazza, Luca; Kar, Gouri Sankar; Furnemont, Arnaud; Fantini, Andrea; Donadio, Gabriele Luca; Souriau, Laurent; Crotti, Davide; Yasin, Farrukh; Appeltans, Raf; Rao, Siddharth; De Simone, Danilo; Rincon Delgadillo, Paulina; Leray, Philippe; Charley, Anne-Laure; Zhou, Daisy; Veloso, Anabela; Collaert, Nadine; Hasumi, Kazuhisa; Koshihara, Shunsuke; Ikota, Masami; Okagawa, Yutaka; Ishimoto, Toru (2017) -
Evaluation of roughness transfer from Litho to Etch using CD-SEM
Tanaka, Motohiro; Ishimoto, Toru; Kazumi, H.; Cheng, Shaunee (2012) -
Further study on the verification of CD-SEM based monitoring for hyper NA lithography
Ishimoto, Toru; Osaki, M.; Sekiguchi, Kohei; Hasegawa, N.; Watanabe, K.; Laidler, David; Cheng, Shaunee (2008) -
Impact of annealing temperature on DSA process: toward faster assembly kinetics
Suh, Hyo Seon; Nair, Vineet Vijayakrishnan; Rincon Delgadillo, Paulina; Doise, Jan; Lorusso, Gian; Nealey, Paul; Monreal, Victor; Baskaran, Durairaj; Cao, Yi; Padmanaban, Munirathna; Li, Jin; Kato, Takeshi; Sutani, Takumichi; Ishimoto, Toru; Ikota, Masami; Koshihara, Shunsuke (2018) -
LCDU and placement improvement of contacts using EUV templated DSA
Boeckx, Carolien; Doise, Jan; Chan, BT; Lorusso, Gian; Sutani, Takumichi; Koshihara, Shunsuke; Ishimoto, Toru; Kato, Takeshi; Rincon Delgadillo, Paulina; De Gendt, Stefan (2018) -
Need for LWR metrology standardization: the imec roughness protocol
Lorusso, Gian; Sutani, Takeyoshi; Rutigliani, Vito; Van Roey, Frieda; Moussa, Alan; Charley, Anne-Laure; Mack, Chris; Naulleau, Patrick; Perera, Chami; Constantoudis, Vassilios; Ikota, Masami; Ishimoto, Toru; Koshihara, Shunshuke (2018) -
Resist roughness evaluation and frequency analysis: metrological challenges and potential solutions for EUV lithography
Vaglio Pret, Alessandro; Gronheid, Roel; Ishimoto, Toru; Sekiguchi, Kohei (2010) -
Study on practical application of pattern top resist loss measurement by CD-SEM for high NA immersion lithography
Ishimoto, Toru; Yasui, Naoki; Hasegawa, Norio; Tanaka, Maki; Cheng, Shaunee (2010) -
The need for LWR metrology standardization: the imec roughness protocol
Lorusso, Gian; Sutani, Takeyoshi; Rutigliani, Vito; Van Roey, Frieda; Moussa, Alain; Charley, Anne-Laure; Mack, Chris; Naulleau, Patrick; Constantoudis, Vassilios; Ikota, Masami; Ishimoto, Toru; Koshihara, S (2018)