Browsing by author "Jonckheere, Rik"
Now showing items 21-40 of 226
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Attenuated phase shifting masks in combination with off-axis illumination: A way towards quarter micron DUV lithography for random logic operations
Ronse, Kurt; Pforr, Rainer; Baik, Ki-Ho; Jonckheere, Rik; Van den hove, Luc (1994) -
Automated OPC for application in advanced lithography
Ronse, Kurt; Tritchkov, Alexander; Randall, John; Jonckheere, Rik; Ghandehari, Kouros; Van den hove, Luc (1997) -
Avoiding yield loss for EUV Lithography due to mask
Jonckheere, Rik (2013) -
Blank defect coverage budget for 16nm half-pitch single EUV exposure
Jonckheere, Rik; Yamane, Takeshi; Morikawa, Yasutaka; Kamo, Takashi (2018) -
Calibration and verification of a stochastic model for EUV resist
Gao, Weimin; Philippou, Alexander; Klostermann, Ulrich; Siebert, Joachim; Philipsen, Vicky; Hendrickx, Eric; Vandeweyer, Tom; Jonckheere, Rik (2012) -
Carbon nanotube pellicles: imaging results of the first full-field extreme ultraviolet exposures
Bekaert, Joost; Gallagher, Emily; Jonckheere, Rik; Van Look, Lieve; Aubert, Remko; Klein, Alexander; Yegen, Gokay; Broman, Par; Nair, Vineet Vijayakrishnan; Timmermans, Marina; Pollentier, Ivan; Hendrickx, Eric (2021-05-27) -
CD control for two-dimensional features in future technology nodes
Verhaegen, Staf; Gordon, R.; Jonckheere, Rik; McCallum, M.; Ronse, Kurt (2001) -
Challenges and solutions ensuring EUVL photomask integrity
Brux, O.; Dress, P.; Schmalfuss, H.; Jonckheere, Rik; Koolen-Hermkens, W. (2012) -
Characterization and correction of optical proximity effects in deep-ultraviolet lithography using behavior modeling
Yen, Anthony; Tritchkov, Alexander; Stirniman, J. P.; Vandenberghe, Geert; Jonckheere, Rik; Ronse, Kurt; Van den hove, Luc (1996) -
Characterization of periodic arrays of magnetic dots by x-ray reflectivity experiments
Van Bael, Marleen; Temst, K.; Moshchalkov, V. V.; Bruynseraede, Y.; Jonckheere, Rik (1999) -
Characterization of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images
Raghunathan, Sudhar; Wood, Obert; Mangat, Pawitter; Verduijn, Erik; Philipsen, Vicky; Hendrickx, Eric; Jonckheere, Rik; Goldberg, Ken; Benk, Marcus; Kearney, Pat; Levinson, Zachary; Smith, Bruce (2014) -
Closing the gap for EUV mask repair
Bret, T.; Jonckheere, Rik; Van Den Heuvel, Dieter; Baur, C.; Waiblinger, M.; Baralia, G. (2012) -
CNT pellicles: Imaging results of the first full-field EUV exposures
Bekaert, Joost; Gallagher, Emily; Jonckheere, Rik; Van Look, Lieve; Aubert, Remko; Klein, Alexander; Yegen, Gokay; Broman, Par; Felix, Nelson M.; Lio, Anna; Nair, Vineet Vijayakrishnan; Timmermans, Marina; Pollentier, Ivan; Hendrickx, Eric (2021) -
Co-silicide, Co(Ni)-silicide and Ni-silicide to source/drain contact resistance
Akheyar, Amal; Lauwers, Anne; Kittl, Jorge; de Potter de ten Broeck, Muriel; Chamirian, Oxana; Jonckheere, Rik; Leunissen, Peter; Van Dal, Mark; Lindsay, Richard; Tempel, Georg; Maex, Karen (2003) -
Comparison between existing inspection techniques for EUV mask defects
Van Den Heuvel, Dieter; Jonckheere, Rik; Hendrickx, Eric; Cheng, Shaunee; Ronse, Kurt; Abe, Tsukasa; Magana, John; Bret, Tristan (2010) -
Composite flux-line lattices stabilized in superconducting films by a regular array of artificial defects
Baert, M.; Metlushko, V. V.; Jonckheere, Rik; Moshchalkov, V. V.; Bruynseraede, Y. (1995) -
Contribution of mask defectivity in stochastics of EUVL-based wafer printing
Melvin, Lawrence S., III; Jonckheere, Rik (2021) -
Contribution of mask roughness in stochasticity of high-NA EUV imaging
Jonckheere, Rik; Melvin, Lawrence, III (2021-11) -
Correlation of actinic blank inspection and experimental phase defect printability study on NXE3x00 EUV scanner
Jonckheere, Rik; Van Den Heuvel, Dieter; Takagi, Noriaki; Watanabe, Hidehiro; Gallagher, Emily (2015) -
Critical currents and flux phases in superconducting multilayers with a lattice of submicrometer holes
Baert, M.; Metlushko, V. V.; Potter, C. D.; Rosseel, Erik; Jonckheere, Rik; Moschalkov, V. V.; Bruynseraede, Y. (1994)