Browsing by author "Krishtab, Mikhail"
Now showing items 21-40 of 47
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Inorganic capping layers in advanced photosensitive polymer based RDL processes: processing and reliability
Pinho, Nelson; Chery, Emmanuel; Bhatia, Ritwik; Sundaram, Ganesh; Slabbekoorn, John; Krishtab, Mikhail; Miller, Andy; Beyne, Eric (2023) -
Low-k films modification under EUV and VUV radiation
Rakhimova, T.; Rakhimov, A.; Mankelevich, Y.A.; Lopaev, D.V.; Kovalev, A.S.; Vasil'eva, A.N.; Zyryanov, S.M.; Kurchikov, K.; Proshina, O.; Voloshin, D.G.; Novikova, N.N.; Krishtab, Mikhail; Baklanov, Mikhaïl (2014) -
Low-k materials engineering from 10 nm technology node and beyond
Krishtab, Mikhail (2022) -
Metal barrier induced damage in self-assembly based organosilica low-k dielectrics and its reduction by organic template residues
Krishtab, Mikhail; de Marneffe, Jean-Francois; Armini, Silvia; Meersschaut, Johan; Bender, Hugo; Wilson, Chris; De Gendt, Stefan (2019) -
Metal-barrier induced damage in self-assembly based organosilica low-k dielectrics and its reduction by surfactant residues
Krishtab, Mikhail; de Marneffe, Jean-Francois; Armini, Silvia; Wilson, Chris; De Gendt, Stefan (2018) -
Modification of PECVD and SOG ultralow-k films by CO2 plasma
Olawumi, Teju Tunde; Levrau, E.; Krishtab, Mikhail; Detavernier, C.; Bartha, J.W.; Lazzarino, Frederic; Baklanov, Mikhaïl (2015) -
On the mechanical and electrical properties of self-assembly-based organosilicate porous films
Redzheb, Murad; Armini, Silvia; Berger, Tom; Jacobs, Mattias; Krishtab, Mikhail; Vanstreels, Kris; Bernstorff, Sigrid; Van Der Voort, Pascal (2017) -
On-chip interconnect trends, challenges and solutions: how to keep RC and reliability under control
Tokei, Zsolt; Ciofi, Ivan; Roussel, Philippe; Debacker, Peter; Raghavan, Praveen; van der Veen, Marleen; Jourdan, Nicolas; Wilson, Chris; Vega Gonzalez, Victor; Adelmann, Christoph; Wen, Liang Gong; Croes, Kristof; Varela Pedreira, Olalla; Moors, Kristof; Krishtab, Mikhail; Armini, Silvia; Boemmels, Juergen (2016) -
Plasma halogenated amorphous carbon as growth inhibiting layer for area-selective deposition of titanium oxide
Krishtab, Mikhail; Hung, Joey; Koret, Roy; Turovets, Igor; Shah, Kavita; Rangarajan, Srinivasan; Warad, Laxmi; Zhang, Vanessa; Ameloot, Rob; Armini, Silvia (2020) -
Plasma induced damage mitigation in spin-on self-assembly based ultra low-k dielectrics using template residues
Krishtab, Mikhail; de Marneffe, Jean-Francois; De Gendt, Stefan (2016) -
Plasma induced damage mitigation in spin-on self-assembly based ultra low-k dielectrics using template residues
Krishtab, Mikhail; de Marneffe, Jean-Francois; De Gendt, Stefan; Baklanov, Mikhaïl (2017) -
Pore sealing of k 2.0 dielectrics assisted by self-assembled monolayers deposited from vapor phase
Armini, Silvia; Loyo Prado, Jana; Krishtab, Mikhail; Swerts, Johan; Verdonck, Patrick; Meersschaut, Johan; Conard, Thierry; Blauw, Michiel; Struyf, Herbert; Baklanov, Mikhaïl (2014) -
Pore sealing of porous low-k films by SAMs for ALD
Armini, Silvia; Verdonck, Patrick; Loyo Prado, Jana; Krishtab, Mikhail; Swerts, Johan; Ciofi, Ivan; Meerschaut, Johan; Kim, Tae-Gon; Adelmann, Christoph; Le Quoc, Toan; Van Elshocht, Sven; Delabie, Annelies; Leunissen, Peter; Baklanov, Mikhaïl (2011) -
Pore sealing of porous ultralow-k dielectrics by self-assembled monolayers combined with atomic layer deposition
Armini, Silvia; Loyo Prado, Jana; Swerts, Johan; Sun, Yiting; Krishtab, Mikhail; Meersschaut, Johan; Blauw, Michiel; Baklanov, Mikhaïl; Verdonck, Patrick (2012) -
Post-etch template removal strategy for reduction of plasma induced damage in spin-on OSG low-k dielectrics
Krishtab, Mikhail; Vanstreels, Kris; Baklanov, Mikhaïl; De Gendt, Stefan (2015) -
Ruthenium Atomic Layer Deposition (ALD)-enabled selectivity of Cobalt Electroless Layer Deposition (ELD) on dielectrics
Zyulkov, Ivan; Krishtab, Mikhail; De Gendt, Stefan; Armini, Silvia (2016) -
Selective Ru ALD as a catalyst for sub 7nm bottom-up metal interconnects
Zyulkov, Ivan; Krishtab, Mikhail; De Gendt, Stefan; Armini, Silvia (2017) -
Study of chemical vapor deposition of manganese on porous SiCOH low-k dielectrics using Bis(ethylcyclopentadienyl)manganese
Jourdan, Nicolas; Krishtab, Mikhail; Baklanov, Mikhaïl; Meersschaut, Johan; Wilson, Chris; Ablett, J.; Fonda, E.; Zhao, Larry; Van Elshocht, Sven; Tokei, Zsolt; Vancoille, Eric (2012) -
Study of wet surface activation routes to enable the deposition of monomolecular organic thin films on k2.0 porous dielectrics
Armini, Silvia; Loyo Prado, Jana; Krishtab, Mikhail; Conard, Thierry; Meersschaut, Johan; Le, Quoc Toan; Verdonck, Patrick; Baklanov, Mikhaïl (2014) -
Substrate dependence of ruthenium atomic layer deposition
Soethoudt, Job; Tomczak, Yoann; Popovici, Mihaela Ioana; Krishtab, Mikhail; Van Elshocht, Sven; Altamirano Sanchez, Efrain; Delabie, Annelies (2017)