Browsing by author "Mertens, Paul"
Now showing items 61-80 of 475
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Cleaning of metal gate stacks for the sub 90nm technology node
Kraus, Harald; Vermeyen, Kenneth; Snow, Jim; Fyen, Wim; Mertens, Paul; Kovacs, Frederic (2003) -
Cleaning of metal gate stacks for the sub 90nm technology node
Snow, Jim; Kraus, Harald; Vermeyen, Kenneth; Fyen, Wim; Mertens, Paul; Kovacs, Frederic (2004) -
Cleaning of nanoparticles in semiconductor manufacturing
Vereecke, Guy; Arnauts, Sophia; Doumen, Geert; Eitoku, Atsuro; Fransaer, J.; Fyen, Wim; Holsteyns, Frank; Kenis, Karine; Lee, Kuntack; Lux, Marcel; Snow, Jim; Vinckier, Chris; Vos, Rita; Xu, Kaidong; Mertens, Paul (2004) -
Cleaning of post-etch photoresist layer on patterned surface using organic solvent combined with physical forces
Le, Quoc Toan; Chiodarelli, Nicolo; Blum, Ivan; Kesters, Els; Lux, Marcel; Claes, Martine; Vereecke, Guy; Mertens, Paul (2007-04) -
Cleaning technology for highly reliable gate oxides
Heyns, Marc; Meuris, Marc; Verhaverbeke, Steven; Mertens, Paul; Schmidt, Harald; Rotondaro, Antonio; Hurd, Trace; Hatcher, Z.; Gräf, D. (1994) -
Cleaning uniformity of silicon wafers in megasonic tanks
Vereecke, Guy; Holsteyns, Frank; Veltens, J.; Vos, Rita; Mertens, Paul (2003) -
Cleaning, rinsing and drying effects in post-Cu CMP clean
Fyen, Wim; Vos, Rita; Teerlinck, Ivo; Vrancken, Evi; Grillaert, Joost; Meuris, Marc; Mertens, Paul; Heyns, Marc (2000) -
Cluster tools for semiconductor processing
Mertens, Paul (1994) -
Clustered single wafer wet cleaning
Mertens, Paul; Holsteyns, Frank; Vos, Rita; Vereecke, Guy; Fyen, Wim; Lauerhaas, Jeff; Xu, Kaidong; Bearda, Twan; Teerlinck, Ivo; Arnauts, Sophia; Kenis, Karine; Schmidt, Michael; Heyns, Marc (2002) -
Collapse behavior and forces of multistack nanolines
Kim, Tae-Gon; Wostyn, Kurt; Mertens, Paul; Busnaina, Ahmed A.; Park, Jin-Goo (2010) -
Collapse behavior and forces of multistack patterns
Kim, Tae-Gon; Wostyn, Kurt; Mertens, Paul; Busnaina, Ahmed; Park, Jin Goo (2008) -
Comparison of HCl gas-phase cleaning with conventional and dilute wet chemistries
Elsmore, Chris; Hurd, Trace; Meuris, Marc; Mertens, Paul; Heyns, Marc (1996) -
Comparison of the stability of the surface structure and H-termination of the H2 annealed and HF-last cleaned (100) silicon
Bender, Hugo; Li, Li; Mertens, Paul; Caymax, Matty; Heyns, Marc (1994) -
Competititive adsorption of cations onto the silicon surface: the role of the ammonium ion in ammonia-peroxide solution
Loewenstein, Lee; Mertens, Paul (2000) -
Competitive adsorption of cations onto the silicon surface. The role of the ammonium ion in ammonia-peroxide solution
Loewenstein, Lee; Mertens, Paul (1999) -
Competitive adsorption of cations onto the silicon surface: the role of ammonium ion in APM
Loewenstein, Lee; Mertens, Paul (1999) -
Competitive adsorption of metal ions onto hydrophilic silicon surfaces from aqueous solutions
Loewenstein, Lee; Charpin, Florence; Mertens, Paul (1999) -
Contamination control for the 32nm node
Bearda, Twan; Vos, Rita; Mertens, Paul; Catana, Gabriela; Huyghebaert, Cedric (2008) -
Contamination specifications, an overall perspective
Mertens, Paul (2015) -
Controlled deposition of organic contamination and removal with ozone-based cleaning
Claes, M.; De Gendt, Stefan; Kenens, Conny; Conard, Thierry; Bender, Hugo; Storm, Wolfgang; Bauer, T.; Mertens, Paul; Heyns, Marc (2001)