Browsing by author "Mertens, Paul"
Now showing items 41-60 of 475
-
Capablities of TOF-SIMS to study the influence of different oxidation conditions on metal contamination redistribution
De Witte, Hilde; De Gendt, Stefan; Douglas, M.; Conard, Thierry; Kenis, Karine; Mertens, Paul; Vandervorst, Wilfried; Gijbels, Renaat (1999) -
Challenges and novel approaches for photo resist removal and post-etch residue removal for 22 nm interconnects
Mertens, Paul; Kim, Tae-Gon; Claes, Martine; Le, Quoc Toan; Vereecke, Guy; Kesters, Els; Suhard, Samuel; Pacco, Antoine; Lux, Marcel; Kenis, Karine; Urbanowicz, Adam; Tokei, Zsolt; Beyer, Gerald (2009) -
Challenges of single-wafer wet cleaning for low temperature pre-epitaxial treatment of SiGe
Sano, K.; Leys, Frederik; Dilliway, Gabriela; Loo, Roger; Mertens, Paul; Snow, J.; Izumi, A.; Eitoku, A. (2008) -
Challenges with respect to high-k/metal gate stack etching and cleaning
Vos, Rita; Arnauts, Sophia; Bovie, Inge; Onsia, Bart; Garaud, Sylvain; Xu, Kaidong; Yu, HongYu; Kubicek, Stefan; Rohr, Erika; Schram, Tom; Veloso, Anabela; Conard, Thierry; Leunissen, Peter; Mertens, Paul (2007) -
Characterization of 248nm deep ultraviolet (DUV) photoresist after ion implantation
Tsvetanova, Diana; Vos, Rita; Vereecke, Guy; Clemente, Francesca; Vanstreels, Kris; Conard, Thierry; Vogt, Tatjana; Mertens, Paul; Heyns, Marc (2009) -
Characterization of 248nm deep ultraviolet (DUV) photoresist after ion implantation
Tsvetanova, Diana; Vos, Rita; Vereecke, Guy; Clemente, Francesca; Vanstreels, Kris; Conard, Thierry; Parac-Vogt, Tatjana; Mertens, Paul; Heyns, Marc (2009) -
Characterization of advanced semiconductor materials by thermal desorption mass spectrometry with atmospheric pressure ionization
Carbonell, Laure; Vereecke, Guy; Van Elshocht, Sven; Caymax, Matty; Van Hove, Marleen; Maex, Karen; Mertens, Paul (2003) -
Characterization of low-k dielectric etch residue on the sidewall by chemical force microscope
Kim, Tae-Gon; Le, Quoc Toan; Suhard, Samuel; Lux, Marcel; Vereecke, Guy; Claes, Martine; Struyf, Herbert; De Gendt, Stefan; Mertens, Paul; Heyns, Marc (2010) -
Characterization of post-etch photoresists used in metal hardmask and photoresist mask patterning schemes
Kesters, Els; Claes, Martine; Lux, Marcel; Le, Quoc Toan; Vereecke, Guy; Franquet, Alexis; Conard, Thierry; Mertens, Paul; Adriaensens, Peter; Carleer, Robert; Biebuyck, J.J.; Van Veltem, P.; Bebelman, Sabine (2007) -
Chemical and structural modifications in a 193-nm photoresist after low-k dry etch
Kesters, Els; Claes, Martine; Le, Quoc Toan; Lux, Marcel; Franquet, Alexis; Vereecke, Guy; Mertens, Paul; Frank, Martin M.; Carleer, Robert; Adriaensens, Peter; Biebuyck, J.J.; Bebelman, Sabine (2008) -
Chemicals for the Chlorination of Gate Oxides
Mac Geary, M. J.; Boeglin, H. J.; Lubbers, A.; Mertens, Paul; Vermeire, Bert (1994) -
Chemistry of the silicon oxide surface: adsorption from SC1 solutions
Hall, L.; Sees, J.; Hurd, Trace; Schmidt, B.; Bellay, L.; Loewenstein, Lee; Mertens, Paul (1998) -
Chemistry of the silicon oxide surface: adsorption from SC1 solutions
Hall, L.; Sees, J.; Hurd, Trace; Schmidt, B.; Bellay, L.; Loewenstein, Lee; Mertens, Paul (1999) -
Chlorine precursors for gate oxidation processes
Mc Geary, M. J.; Mertens, Paul; Vermeire, Bert; Heyns, Marc; Sprey, Hessel; Lubbers, A.; Schaekers, Marc (1997) -
Cleaning and damage performance of single wafer cleaning tools using physcial removal forces
Pacco, Antoine; Halder, Sandip; Kenis, Karine; Bearda, Twan; Mertens, Paul (2009) -
Cleaning and damage performance of single wafer cleaning tools using physical removal forces
Pacco, Antoine; Halder, Sandip; Kenis, Karine; Bearda, Twan; Mertens, Paul (2009) -
Cleaning and surface preparation for SiGe and Ge channel device
Wada, M; Takahashi, H; Snow, J; Vos, Rita; Mertens, Paul; Shirakawa, H (2010) -
Cleaning aspects of novel materials after CMP
Vos, Rita; Wada, M.; Arnauts, Sophia; Takahashi, H.; Cuypers, Daniel; Struyf, Herbert; Mertens, Paul (2011) -
Cleaning of III-V materials: surface chemistry considerations
van Dorp, Dennis; Cuypers, Daniel; Arnauts, Sophia; Mertens, Paul; De Gendt, Stefan (2013) -
Cleaning of metal contamination
Mertens, Paul; Hurd, Trace; Gräf, D.; Meuris, Marc; Schmidt, Harald; Heyns, Marc; Kwakman, L.; Hendriks, M.; Kubota, M. (1994)