Browsing imec Publications by author "Mack, Chris"
Now showing items 1-16 of 16
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Characterizing variation in EUV contact hole lithography
Mack, Chris; Lorusso, Gian; De Simone, Danilo; Severi, Joren (2020) -
Determining the ultimate resolution of scanning electron microscope unbiased roughness measurements, part 1: Simulating noise
Mack, Chris; Lorusso, Gian (2019) -
Diagnosing and Removing CD-SEM Metrology Artifacts
Mack, Chris; Lorusso, Gian; Delvaux, Christie (2021) -
e-beam metrology of thin resist for high NA EUVL
Lorusso, Gian; De Simone, Danilo; Zidan, Mohamed; Severi, Joren; Moussa, Alain; Dey, Bappaditya; Halder, Sandip; Goldenshtein, Alex; Houchens, Kevin; Santoro, Gaetano; Fischer, Daniel; Muellender, Angelika; Mack, Chris; Kondo, Tsuyoshi; Shohjoh, Tomoyasu; Ikota, Masami; Charley, Anne-Laure; De Gendt, Stefan; Leray, Philippe (2023) -
Evolution of roughness during the pattern transfer of high-chi, 10 nm half-pitch, silicon-containing block copolymer structures
Blachut, Gregory; Sirard, Stephen; Liang, Andrew; Mack, Chris; Maher, Michael; Rincon Delgadillo, Paulina; Chan, BT; Mannaert, Geert; Vandenberghe, Geert; Willson, Grant; Ellison, Christopher; Hymes, Diane (2018) -
Metrology of Thin Resist for High NA EUVL
Lorusso, Gian; Beral, Christophe; Bogdanowicz, Janusz; De Simone, Danilo; Hasan, Mahmudul; Jehoul, Christiane; Moussa, Alain; Saib, Mohamed; Zidan, Mohamed; Severi, Joren; Truffert, Vincent; Van Den Heuvel, Dieter; Goldenshtein, Alex; Houchens, Kevin; Santoro, Gaetano; Fischer, Daniel; Muellender, Angelika; Hung, Joey; Koret, Roy; Turovets, Igor; Ausschnitte, Kit; Mack, Chris; Kondo, Tsuyoshi; Shohjoh, Tomoyasu; Ikota, Masami; Charley, Anne-Laure; Leray, Philippe (2022) -
Need for LWR metrology standardization: the imec roughness protocol
Lorusso, Gian; Sutani, Takeyoshi; Rutigliani, Vito; Van Roey, Frieda; Moussa, Alan; Charley, Anne-Laure; Mack, Chris; Naulleau, Patrick; Perera, Chami; Constantoudis, Vassilios; Ikota, Masami; Ishimoto, Toru; Koshihara, Shunshuke (2018) -
Role of landing energy in e-beam metrology of thin photoresist for high-numerical aperture extreme ultraviolet lithography
Zidan, Mohamed; Fischer, Daniel; Severi, Joren; De Simone, Danilo; Moussa, Alain; Mullender, Angelika; Mack, Chris; Charley, Anne-Laure; Leray, Philippe; De Gendt, Stefan; Lorusso, Gian (2023) -
Roughness study on L/S patterning with chemo
Dudash, Viktor; Suh, Hyo Seon; Lorusso, Gian; Her, YoungJun; Li, Jin; Monreal, Victor; Baskaran, Durairaj; ALPERSON, BOAZ; SKJONNEMAND, KARL; Mack, Chris (2019) -
Roughness study on line and space patterning with chemo-epitaxy directed self-assembly
Suh, Hyo Seon; Dudash, Viktor; Lorusso, Gian; Her, YoungJun; Li, Jin; Monreal, Victor; Baskaran, Durairaj; ALPERSON, BOAZ; SKJONNEMAND, KARL; Mack, Chris (2020) -
Setting up a proper power spectral density (PSD) and autocorrelation analysis for material and process characterization
Rutigliani, Vito; Lorusso, Gian; De Simone, Danilo; Lazzarino, Frederic; Rispens, Gijsbert; Papavieros, George; Gogolides, Evangelos; Costantoudis, Vassilios; Mack, Chris (2018) -
The need for LWR metrology standardization: the imec roughness protocol
Lorusso, Gian; Sutani, Takeyoshi; Rutigliani, Vito; Van Roey, Frieda; Moussa, Alain; Charley, Anne-Laure; Mack, Chris; Naulleau, Patrick; Constantoudis, Vassilios; Ikota, Masami; Ishimoto, Toru; Koshihara, S (2018) -
Unbiased roughness measurements: subtracting out SEM effects
Lorusso, Gian; Rutigliani, Vito; Van Roey, Frieda; Mack, Chris (2017) -
Unbiased roughness measurements: Subtracting out SEM effects
Lorusso, Gian; Rutigliani, Vito; Van Roey, Frieda; Mack, Chris (2018) -
Unbiased roughness measurements: Subtracting out SEM effects, Part 2
Lorusso, Gian; Rutigliani, Vito; Van Roey, Frieda; Mack, Chris (2018) -
Unbiased roughness measurements: Subtracting out SEM effects, part 3
Mack, Chris; Van Roey, Frieda; Lorusso, Gian (2019)