Browsing Conference contributions by imec author "9d8d0492b545e613b7b5c336e809dc5442e43536"
Now showing items 1-16 of 16
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Advanced etching for nanodevices and 2D materials
de Marneffe, Jean-Francois; Cooke, Mike; Goodyear, Andy; Braithwaite, Nicolas; Sutton, Yvonne; Bowden, Mark; Altamirano Sanchez, Efrain; Zotovich, Alexey; El Otell, Ziad; Chan, BT; Knoll, Armin; Rawlings, Colin; Duerig, Urs; Spiesser, Martin; Kaestner, Marcus; Neuber, Christian; Rangelow, Ivo (2016) -
Ar and H2 plasma and neutral/ion beam treatment of EUV resist
De Schepper, Peter; Marinov, Daniil; El Otell, Ziad; Altamirano Sanchez, Efrain; de Marneffe, Jean-Francois; De Gendt, Stefan; Braithwaite, Nicholas St. J. (2015-03) -
Challenges for line width / line edge roughness (LWR/lER) improvement in Directed Self-Assembly (DSA) advanced patterning
Chan, BT; Pathangi Sriraman, Hari; Singh, Arjun; El Otell, Ziad; Gronheid, Roel; de Marneffe, Jean-Francois; Piumi, Daniele (2015) -
Comparison between vacuum ultra-violet emission of CF4/Ar and CF3I/Ar plasmas in CCP chamber for low-k etching
Zotovich, A.; El Otell, Ziad; de Marneffe, Jean-Francois; Proshina, O.; Lopaev, D.; Rakhimova, T.; Baklanov, Mikhaïl (2015) -
Development and characterization of a fast neutral beam source for damage-free etching
Marinov, Daniil; El Otell, Ziad; Bowden, Mark; Braithwaite, Nicholas (2014) -
Development of a novel wafer probe for in-situ measurements
El Otell, Ziad; Marinov, Daniil; Samra, Vladimir; Bowden, Mark; de Marneffe, Jean-Francois; Verdonck, Patrick; Braithwaite, Nicholas (2014) -
Enhancing etch contrast in DSA block copolymer films with sequential infiltration synthesis on 300mm Si substrates
Singh, Arjun; Sayan, Safak; El Otell, Ziad; Chan, BT; Gronheid, Roel (2014) -
Hydrogen plasma treatment: the evolution of roughness in frequency domain
De Schepper, Peter; Vaglio Pret, Alessandro; Altamirano Sanchez, Efrain; El Otell, Ziad; De Gendt, Stefan (2014) -
Impact of sequential infiltration synthesis on pattern fidelity of DSA lines
Singh, Arjun; Knaepen, Werner; Sayan, Safak; El Otell, Ziad; Chan, BT; Maes, Jan; Gronheid, Roel (2015) -
Molecular glass resist performance for nano-pattern transfer
El Otell, Ziad; Ringk, Andreas; Kolb, Tristan; Neuber, Christian; Haensel, Leander; de Marneffe, Jean-Francois (2015-03) -
Photoresist treatment using an ICP H2 plasma and low ESC temperature: LWR study
De Schepper, Peter; Altamirano Sanchez, Efrain; Goodyear, Andy; El Otell, Ziad; de Marneffe, Jean-Francois; De Gendt, Stefan (2014) -
Photoresist treatment using an ICP H2 plasma and low ESC temperature: LWR study
De Schepper, Peter; Altamirano Sanchez, Efrain; Goodyear, Andy; El Otell, Ziad; de Marneffe, Jean-Francois; De Gendt, Stefan (2014) -
Plasma patterning of SIS modified DSA line space patterns into silicon
El Otell, Ziad; Singh, Arjun; Chan, BT; Gronheid, Roel; de Marneffe, Jean-Francois (2015) -
The influence of hydrogen plasma treatment on LWR mitigation: The importance of EUV photoresist composition
De Schepper, Peter; El Otell, Ziad; de Marneffe, Jean-Francois; Altamirano Sanchez, Efrain; De Gendt, Stefan (2014) -
Ultra low-k etching by neutral beams produced from CF4/Ar and SF6/Ar ICP plasmas
Zotovich, Alexey; El Otell, Ziad; Sutton, Yvonne; Braithwaite, N. St. J.; de Marneffe, Jean-Francois; Baklanov, Mikhail (2016) -
Vacuum ultra-violet emission of plasmas and their effect on etched materials
El Otell, Ziad; de Marneffe, Jean-Francois (2015)