Recently added

Thermal characterization of the inter-die thermal resistance of hybrid Cu/dielectric wafer-to-wafer bonding

Oprins, Herman; Cherman, Vladimir; Webers, Tomas; Salahouelhadj, Abdellah; Kim, Soon-Wook; Peng, Lan; Van der Plas, Geert; Beyne, Eric (2016-05)

Low temperature effect on strained and relaxed Ge pFinFETs STI last processes

Oliveira, Alberto; Simoen, Eddy; Agopian, Paula G.D.; Martino, Joao A.; Mitard, Jerome; Witters, Liesbeth; Collaert, Nadine; Thean, Aaron; Claeys, Cor (2016)

Substrate independent mechanical properties of thin low dielectric constant materials

Okudur, Oguzhan Orkut; Vanstreels, Kris; Hangen, Ude; Qui, Anqi; De Wolf, Ingrid (2016)

Mmwave antenna and 5G testbed characterization

Ocket, Ilja; Pollin, Sofie (2016)

Millimeter wave planar transition from plastic waveguide to 1mm coax

Ocket, Ilja; Cauwe, Maarten; Nauwelaers, Bart (2016)

Stress measurements in semiconductor devices using nano-focused Raman spectroscopy

Nuytten, Thomas; Kosemura, Daisuke; Bogdanowicz, Janusz; Witters, Liesbeth; Eneman, Geert; Hantschel, Thomas; Schulze, Andreas; Favia, Paola; Bender, Hugo; De Wolf, Ingrid; Vandervorst, Wilfried (2016)

Accuracy of quasi-Monte Carlo technique in failure probability estimations

Noltsis, Michail; Weckx, Pieter; Rodopoulos, Dimitrios; Catthoor, Francky; Soudris, Dimitrios (2016)

Broadband stationary fourier transform spectrometer integrated on a silicon nitride photonics platform

Nie, Xiaomin; Ryckeboer, Eva; Roelkens, Gunther; Baets, Roel (2016)

Novel concept for a broadband co-propagative stationary fourier transform spectrometer integrated on a Si3N4 waveguide platform

Nie, Xiaomin; Ryckeboer, Eva; Roelkens, Gunther; Baets, Roel (2016)

Imaging semiconductor patterns at N10 logic node with a high-throughput multi-beam SEM

Neumann, J.T.; Garaboski, T.; Halder, Sandip; Leray, Philippe; Garreis, R.; Zeidler, D. (2016)

Influence of proton radiation and strain on nFinFET zero temperature coefficient

Nascimento, Vinicius; Agopian, Paula G.D.; Almeida, Luciano; Bordallo, Caio; Simoen, Eddy; Claeys, Cor; Martino, Joao A. (2016)

Interdigitated back contact silicon solar cells: diode and resistance investigation at nanoscale using Kelvin Probe Force Microscopy

Narchi, Paul; Bearda, Twan; Foldyna, Martin; Prod'Homme, Patricia; Roca i Cabarrocas, Pere (2016)

Static and low frequency noise characterization of n-channel 16nm UTBOX devices

Nafaa, B.; Ismail, N.; Touayar, O.; Cretu, B.; Simoen, Eddy (2016)

Flexible thin-film NFC transponder chip exhibiting data rates compatible to ISO NFC standards using self-aligned metal-oxide TFTs

Myny, Kris; Steudel, Soeren (2016)

Conference contributions: Recent submissions

Thermal characterization of the inter-die thermal resistance of hybrid Cu/dielectric wafer-to-wafer bonding

Low temperature effect on strained and relaxed Ge pFinFETs STI last processes

Substrate independent mechanical properties of thin low dielectric constant materials

Mmwave antenna and 5G testbed characterization

Millimeter wave planar transition from plastic waveguide to 1mm coax

Stress measurements in semiconductor devices using nano-focused Raman spectroscopy

Accuracy of quasi-Monte Carlo technique in failure probability estimations

Broadband stationary fourier transform spectrometer integrated on a silicon nitride photonics platform

Novel concept for a broadband co-propagative stationary fourier transform spectrometer integrated on a Si3N4 waveguide platform

Imaging semiconductor patterns at N10 logic node with a high-throughput multi-beam SEM

Influence of proton radiation and strain on nFinFET zero temperature coefficient

Interdigitated back contact silicon solar cells: diode and resistance investigation at nanoscale using Kelvin Probe Force Microscopy

Static and low frequency noise characterization of n-channel 16nm UTBOX devices

Flexible thin-film NFC transponder chip exhibiting data rates compatible to ISO NFC standards using self-aligned metal-oxide TFTs

Dopant segregation in Si and Ge CVD epitaxial growth

Dopant segregation in Si and Ge CVD epitaxial growth

Atomically controlled processing for Ge CVD epitaxial growth

Atomically controlled processing for Si and Ge CVD epitaxial growth

Atomically controlled processing for Si and Ge CVD epitaxial growth

EI4GroupIV: Excellence Initiative for New Group IV semiconductor materials & processing

Conference contributions: Recent submissions

Thermal characterization of the inter-die thermal resistance of hybrid Cu/dielectric wafer-to-wafer bonding ﻿

Low temperature effect on strained and relaxed Ge pFinFETs STI last processes ﻿

Substrate independent mechanical properties of thin low dielectric constant materials ﻿

Mmwave antenna and 5G testbed characterization ﻿

Millimeter wave planar transition from plastic waveguide to 1mm coax ﻿

Stress measurements in semiconductor devices using nano-focused Raman spectroscopy ﻿

Accuracy of quasi-Monte Carlo technique in failure probability estimations ﻿

Broadband stationary fourier transform spectrometer integrated on a silicon nitride photonics platform ﻿

Novel concept for a broadband co-propagative stationary fourier transform spectrometer integrated on a Si3N4 waveguide platform ﻿

Imaging semiconductor patterns at N10 logic node with a high-throughput multi-beam SEM ﻿

Influence of proton radiation and strain on nFinFET zero temperature coefficient ﻿

Interdigitated back contact silicon solar cells: diode and resistance investigation at nanoscale using Kelvin Probe Force Microscopy ﻿

Static and low frequency noise characterization of n-channel 16nm UTBOX devices ﻿

Flexible thin-film NFC transponder chip exhibiting data rates compatible to ISO NFC standards using self-aligned metal-oxide TFTs ﻿

Dopant segregation in Si and Ge CVD epitaxial growth ﻿

Dopant segregation in Si and Ge CVD epitaxial growth ﻿

Atomically controlled processing for Ge CVD epitaxial growth ﻿

Atomically controlled processing for Si and Ge CVD epitaxial growth ﻿

Atomically controlled processing for Si and Ge CVD epitaxial growth ﻿

EI4GroupIV: Excellence Initiative for New Group IV semiconductor materials & processing ﻿

Thermal characterization of the inter-die thermal resistance of hybrid Cu/dielectric wafer-to-wafer bonding

Low temperature effect on strained and relaxed Ge pFinFETs STI last processes

Substrate independent mechanical properties of thin low dielectric constant materials

Mmwave antenna and 5G testbed characterization

Millimeter wave planar transition from plastic waveguide to 1mm coax

Stress measurements in semiconductor devices using nano-focused Raman spectroscopy

Accuracy of quasi-Monte Carlo technique in failure probability estimations

Broadband stationary fourier transform spectrometer integrated on a silicon nitride photonics platform

Novel concept for a broadband co-propagative stationary fourier transform spectrometer integrated on a Si3N4 waveguide platform

Imaging semiconductor patterns at N10 logic node with a high-throughput multi-beam SEM

Influence of proton radiation and strain on nFinFET zero temperature coefficient

Interdigitated back contact silicon solar cells: diode and resistance investigation at nanoscale using Kelvin Probe Force Microscopy

Static and low frequency noise characterization of n-channel 16nm UTBOX devices

Flexible thin-film NFC transponder chip exhibiting data rates compatible to ISO NFC standards using self-aligned metal-oxide TFTs

Dopant segregation in Si and Ge CVD epitaxial growth

Dopant segregation in Si and Ge CVD epitaxial growth

Atomically controlled processing for Ge CVD epitaxial growth

Atomically controlled processing for Si and Ge CVD epitaxial growth

Atomically controlled processing for Si and Ge CVD epitaxial growth

EI4GroupIV: Excellence Initiative for New Group IV semiconductor materials & processing