Browsing Presentations by author "Maenhoudt, Mireille"
Now showing items 1-18 of 18
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Advanced optical lithography: double patterning options for 32 and 22nm node
Vandeweyer, Tom; Maenhoudt, Mireille; Vangoidsenhoven, Diziana; Gronheid, Roel; Versluijs, Janko; Miller, Andy; Bekaert, Joost; Truffert, Vincent; Wiaux, Vincent (2009) -
Advanced solutions for copper and low k technology
Beyer, Gerald; Baklanov, Mikhaïl; Brongersma, Sywert; De Roest, David; Donaton, R.; Grillaert, Joost; Lanckmans, Filip; Maenhoudt, Mireille; Maex, Karen; Richard, Emmanuel; Struyf, Herbert; Stucchi, Michele; Tokei, Zsolt; Van Hove, Marleen; Vervoort, Iwan (2000) -
Back-end, low-k dielectric compatible resist rework procedure
Reybrouck, Mario; Vangoidsenhoven, Diziana; Maenhoudt, Mireille; Van Aelst, Joke; Boullart, Werner (2002) -
Double litho, double etch (LELE) process challenges for 22nm HP and beyond
Maenhoudt, Mireille; Wiaux, Vincent; Cheng, Shaunee; Vandenberghe, Geert; Ronse, Kurt (2008) -
Double patterning process development at IMEC
Maenhoudt, Mireille; Vangoidsenhoven, Diziana; Vandeweyer, Tom; Gronheid, Roel; Versluijs, Janko; Miller, Andy (2008) -
Double patterning: from split to process control
Wiaux, Vincent; Ercken, Monique; Maenhoudt, Mireille; Cheng, Shaunee (2007) -
Extreme scaling of optical lithography: overview of process integration issues
Ronse, Kurt; Wiaux, Vincent; Verhaegen, Staf; Van Look, Lieve; Bekaert, Joost; Laidler, David; Cheng, Shaunee; Maenhoudt, Mireille; Vandenberghe, Geert; Dusa, Mircea (2009) -
Integrations of Cu and low-k dielectrics: effect of hard mask dry etch and post-CMP clean on electrical performance of damascene structures
Donaton, R. A.; Coenegrachts, Bart; Maenhoudt, Mireille; Pollentier, Ivan; Struyf, Herbert; Vanhaelemeersch, Serge; Grillaert, Joost; Fyen, Wim; Beyer, Gerald; Stucchi, Michele; Richard, Emmanuel; Vervoort, Iwan; De Roest, David; Maex, Karen (2000) -
Local oxidation of silicon and titanium surfaces with a scanning probe microsope
Vullers, R. J. M.; Daniels, H.; Maenhoudt, Mireille; Van Haesendonck, Chris; Van Hove, Marleen (1996) -
Mask aligner lithography simulation
Duval, Fabrice; Meliorisz, Balint; Slabbekoorn, John; Maenhoudt, Mireille; Miller, Andy; Unal, Nezih; Ritter, Daniel (2010) -
Meeting double patterning challenges: from split to process control
Wiaux, Vincent; Cheng, Shaunee; Maenhoudt, Mireille; Storms, Greet; Vandenberghe, Geert; Verhaegen, Staf (2007) -
Opportunities and challenges in immersion lithography
Maenhoudt, Mireille; Vandenberghe, Geert; Ercken, Monique; Cheng, Shaunee; Leunissen, Peter; Ronse, Kurt (2005) -
Overview on double exposure and double patterning
Jonckheere, Rik; Maenhoudt, Mireille (2007) -
Performance update of XT:1250Di
Maenhoudt, Mireille; Van Den Heuvel, Dieter; Cheng, Shaunee; Laidler, David; Hermans, Jan (2005) -
Process optimization and integration of trimethylsilane deposited a-SiC:H and SiOC:H dielectric thin films for damascene processing
Gray, William; Loboda, M.; Struyf, Herbert; Van Hove, Marleen; Donaton, R. A.; Sleeckx, Erik; Stucchi, Michele; Gao, Teng; Boullart, Werner; Coenegrachts, Bart; Maenhoudt, Mireille; Vanhaelemeersch, Serge; Meynen, Herman; Maex, Karen (2000) -
Spacer self aligned double patterning: process control
Vandeweyer, Tom; Altamirano Sanchez, Efrain; Vangoidsenhoven, Diziana; Murdoch, Gayle; Groenendijk, Remco; Hepp, Birgitt; Mos, Evert; Finders, Jo; Vleeming, Bert; Dusa, Mircea; Maenhoudt, Mireille (2009) -
Sub-32nm half pitch imaging with high NA immersion exposure systems using Double Patterning techniques
Vleeming, Bert; Maenhoudt, Mireille; Quaedackers, John; van der Heijden, Eddy; de Haas, Paul; Uzunbajakau, Siarhei; Meessen, Jeroen; Dicker, Gerald; Finders, Jo; Dusa, Mircea; Jaenen, Patrick; Locorotondo, Sabrina (2007) -
The importance of dynamic contact angles in immersion lithography and how to measure them
Fyen, Wim; Wells, Gregg; Kocsis, Michael; Kim, H-W; Maenhoudt, Mireille (2005)