Browsing by Author "Autran, J.L."
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Publication A simulation analysis of FIBL in decananometer double-gate MOSFETs with high-k gate dielectrics
Journal article2005, Journal of Non-Crystalline Solids, (351) 21_23, p.1897-1901Publication Defect generation in ultrathin SiON/ZrO2 gate dielectric stacks
Journal article2002, Journal of the Electrochemical Society, (149) 12, p.F181-F185Publication Detrimental impact of hydrogen on negative bias temperature instabilities in HfO2-based pMOSFETs
Proceedings paper2004, Symposium on VLSI Technology. Digest of Technical Papers, 15/06/2004, p.212-213Publication Electrical characteristics of Ge/GeOx(N)/HfO2 gate stacks
Oral presentation2004, 5th Symposium on SiO2, Advanced Dielectrics, and Related DevicesPublication Electrical characteristics of Ge/GeOx(N)/HfO2 gate stacks
Journal article2005, Journal of Non-Crystalline Solids, (351) 21_23, p.1902-1905Publication Electrical modeling and simulation of nanoscale MOS devices with a high-permittivity dielectric gate stack
Proceedings paper2004, Integration of Advanced Micro- and Nanoelectronic Devices - Critical Issues and Solutions, 12/04/2004, p.D6.1Publication Electron transport through high-k dielectric barriers: A non-equilibrium Green's function (NEGF) study
Journal article2009, Journal of Non-Crystalline Solids, (355) 18, p.1180-1184Publication Ge deep sub-micron pFETs with etched TaN metal gate on a High-K dielectric, fabricated in a 200mm silicon prototyping line
Proceedings paper2004, Proceedings of the 34th European Solid-State Device Research Conference - ESSDERC, 21/09/2004, p.189-192Publication Impact of high-k gate dielectrics on decananometer double-gate MOSFETs: gate-fringing field and parasitic charge effects
Proceedings paper2004, Proceedings Ultimate Integration of Silicon (ULIS) Workshop, 11/03/2004, p.39-42Publication Model for defect generation at the (100) Si/SiO2 interface during electron injection in MOS structures
Journal article2003, Applied Surface Science, 212-213, p.749-752Publication Model for interface defect and positive charge generation in ultrathin SiO2/ZrO2 gate dielectric stacks
Journal article2002, Applied Physics Letters, (81) 4, p.709-711Publication Role of hydrogen on negative bias temperature instability in HfO2-based hole channel field-effect transistors
Journal article2004, Applied Physics Letters, (85) 11, p.2101-2103Publication Simulations of bias temperature instabilities in p-MOSFETs with HfySiOx-based gate dielectrics
Proceedings paper2004, Physics and Technology of High-k Gate Dielectrics II, 12/10/2003, p.333-341